JPS5216172A - Rotatory treatment device - Google Patents

Rotatory treatment device

Info

Publication number
JPS5216172A
JPS5216172A JP9188175A JP9188175A JPS5216172A JP S5216172 A JPS5216172 A JP S5216172A JP 9188175 A JP9188175 A JP 9188175A JP 9188175 A JP9188175 A JP 9188175A JP S5216172 A JPS5216172 A JP S5216172A
Authority
JP
Japan
Prior art keywords
treatment device
rotatory
treated surface
lays
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9188175A
Other languages
Japanese (ja)
Inventor
Joichiro Kageyama
Norio Anzai
Tatsumi Shirasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9188175A priority Critical patent/JPS5216172A/en
Publication of JPS5216172A publication Critical patent/JPS5216172A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: In the rotary treatment device for the semiconductor wafer, by providing a chuck which lays the treated surface facing downward so that dust will not stick on the treated surface, to make the highly accurate treatment possible.
COPYRIGHT: (C)1977,JPO&Japio
JP9188175A 1975-07-30 1975-07-30 Rotatory treatment device Pending JPS5216172A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9188175A JPS5216172A (en) 1975-07-30 1975-07-30 Rotatory treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9188175A JPS5216172A (en) 1975-07-30 1975-07-30 Rotatory treatment device

Publications (1)

Publication Number Publication Date
JPS5216172A true JPS5216172A (en) 1977-02-07

Family

ID=14038892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9188175A Pending JPS5216172A (en) 1975-07-30 1975-07-30 Rotatory treatment device

Country Status (1)

Country Link
JP (1) JPS5216172A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114322A (en) * 1980-02-14 1981-09-08 Fujitsu Ltd Developing method for photoresist
JPS57112756A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Rotary spin processor turned upside down
JPS59208832A (en) * 1983-05-13 1984-11-27 Hitachi Tokyo Electronics Co Ltd Applicator
JPS62101028A (en) * 1985-10-25 1987-05-11 Rohm Co Ltd Developing method for wafer
JPS62140725U (en) * 1986-02-27 1987-09-05
JPH0390431U (en) * 1989-12-28 1991-09-13

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114322A (en) * 1980-02-14 1981-09-08 Fujitsu Ltd Developing method for photoresist
JPS57112756A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Rotary spin processor turned upside down
JPS59208832A (en) * 1983-05-13 1984-11-27 Hitachi Tokyo Electronics Co Ltd Applicator
JPS62101028A (en) * 1985-10-25 1987-05-11 Rohm Co Ltd Developing method for wafer
JPH0574931B2 (en) * 1985-10-25 1993-10-19 Rohm Kk
JPS62140725U (en) * 1986-02-27 1987-09-05
JPH0390431U (en) * 1989-12-28 1991-09-13

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