JPS5216172A - Rotatory treatment device - Google Patents
Rotatory treatment deviceInfo
- Publication number
- JPS5216172A JPS5216172A JP9188175A JP9188175A JPS5216172A JP S5216172 A JPS5216172 A JP S5216172A JP 9188175 A JP9188175 A JP 9188175A JP 9188175 A JP9188175 A JP 9188175A JP S5216172 A JPS5216172 A JP S5216172A
- Authority
- JP
- Japan
- Prior art keywords
- treatment device
- rotatory
- treated surface
- lays
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: In the rotary treatment device for the semiconductor wafer, by providing a chuck which lays the treated surface facing downward so that dust will not stick on the treated surface, to make the highly accurate treatment possible.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9188175A JPS5216172A (en) | 1975-07-30 | 1975-07-30 | Rotatory treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9188175A JPS5216172A (en) | 1975-07-30 | 1975-07-30 | Rotatory treatment device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5216172A true JPS5216172A (en) | 1977-02-07 |
Family
ID=14038892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9188175A Pending JPS5216172A (en) | 1975-07-30 | 1975-07-30 | Rotatory treatment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5216172A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56114322A (en) * | 1980-02-14 | 1981-09-08 | Fujitsu Ltd | Developing method for photoresist |
JPS57112756A (en) * | 1980-12-29 | 1982-07-13 | Fujitsu Ltd | Rotary spin processor turned upside down |
JPS59208832A (en) * | 1983-05-13 | 1984-11-27 | Hitachi Tokyo Electronics Co Ltd | Applicator |
JPS62101028A (en) * | 1985-10-25 | 1987-05-11 | Rohm Co Ltd | Developing method for wafer |
JPS62140725U (en) * | 1986-02-27 | 1987-09-05 | ||
JPH0390431U (en) * | 1989-12-28 | 1991-09-13 |
-
1975
- 1975-07-30 JP JP9188175A patent/JPS5216172A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56114322A (en) * | 1980-02-14 | 1981-09-08 | Fujitsu Ltd | Developing method for photoresist |
JPS57112756A (en) * | 1980-12-29 | 1982-07-13 | Fujitsu Ltd | Rotary spin processor turned upside down |
JPS59208832A (en) * | 1983-05-13 | 1984-11-27 | Hitachi Tokyo Electronics Co Ltd | Applicator |
JPS62101028A (en) * | 1985-10-25 | 1987-05-11 | Rohm Co Ltd | Developing method for wafer |
JPH0574931B2 (en) * | 1985-10-25 | 1993-10-19 | Rohm Kk | |
JPS62140725U (en) * | 1986-02-27 | 1987-09-05 | ||
JPH0390431U (en) * | 1989-12-28 | 1991-09-13 |
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