JPS5676532A - Exposure of electron beam - Google Patents
Exposure of electron beamInfo
- Publication number
- JPS5676532A JPS5676532A JP15405879A JP15405879A JPS5676532A JP S5676532 A JPS5676532 A JP S5676532A JP 15405879 A JP15405879 A JP 15405879A JP 15405879 A JP15405879 A JP 15405879A JP S5676532 A JPS5676532 A JP S5676532A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- electron beam
- exposure
- scanning speed
- width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To prevent insufficient exposure of microminiature pattern by varying electron beam scanning speed in response to the size of a pattern element when selectively scanning the electron beam on the pattern element forming a predetermined pattern configuration. CONSTITUTION:An output from a computer 1 is applied to a pattern generator 2 and a motor control circuit 8 for controlling a specimen stage 10. When exposing the exposure pattern by decomposing the pattern into pattern elements (rectangular pattern), a function for varying the electron beam scanning speed in response to the size of the pattern element (width of electron beam) is provided at the generator 2, and the scanning speed is decelerated in exposure on the region having small beam width. Since the scanning speed can be thus varied according to the beam width of the element pattern, a sharp drawing pattern can be formed in a short time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15405879A JPS5676532A (en) | 1979-11-27 | 1979-11-27 | Exposure of electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15405879A JPS5676532A (en) | 1979-11-27 | 1979-11-27 | Exposure of electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5676532A true JPS5676532A (en) | 1981-06-24 |
Family
ID=15575984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15405879A Pending JPS5676532A (en) | 1979-11-27 | 1979-11-27 | Exposure of electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5676532A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0245907A2 (en) * | 1986-05-16 | 1987-11-19 | Philips Electronics Uk Limited | Electron beam pattern generator control |
US5798528A (en) * | 1997-03-11 | 1998-08-25 | International Business Machines Corporation | Correction of pattern dependent position errors in electron beam lithography |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380168A (en) * | 1976-12-25 | 1978-07-15 | Fujitsu Ltd | Exposure method for electronic beam |
-
1979
- 1979-11-27 JP JP15405879A patent/JPS5676532A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380168A (en) * | 1976-12-25 | 1978-07-15 | Fujitsu Ltd | Exposure method for electronic beam |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0245907A2 (en) * | 1986-05-16 | 1987-11-19 | Philips Electronics Uk Limited | Electron beam pattern generator control |
US5798528A (en) * | 1997-03-11 | 1998-08-25 | International Business Machines Corporation | Correction of pattern dependent position errors in electron beam lithography |
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