JPS5674936A - Position detection method of semiconductor chip - Google Patents

Position detection method of semiconductor chip

Info

Publication number
JPS5674936A
JPS5674936A JP15261879A JP15261879A JPS5674936A JP S5674936 A JPS5674936 A JP S5674936A JP 15261879 A JP15261879 A JP 15261879A JP 15261879 A JP15261879 A JP 15261879A JP S5674936 A JPS5674936 A JP S5674936A
Authority
JP
Japan
Prior art keywords
semiconductor chip
masking sheet
detection method
position detection
ray level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15261879A
Other languages
Japanese (ja)
Inventor
Hisaaki Kojima
Masashi Nishizaki
Masao Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP15261879A priority Critical patent/JPS5674936A/en
Publication of JPS5674936A publication Critical patent/JPS5674936A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Abstract

PURPOSE:To perform a positioning by a method wherein the difference between a masking sheet reflected ray level and a semiconductor chip reflected ray level is made great to detect the position of a chip. CONSTITUTION:A surface of a masking sheet is made rough to generate an irregular reflection or it is painted with color to magnify an absorption factor of light. Or both are performed. With this, even if there exists an unequality in the superficial state of a semiconductor chip, reflected rays of a masking sheet are made small, as a result, a stable detection can be always performed.
JP15261879A 1979-11-22 1979-11-22 Position detection method of semiconductor chip Pending JPS5674936A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15261879A JPS5674936A (en) 1979-11-22 1979-11-22 Position detection method of semiconductor chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15261879A JPS5674936A (en) 1979-11-22 1979-11-22 Position detection method of semiconductor chip

Publications (1)

Publication Number Publication Date
JPS5674936A true JPS5674936A (en) 1981-06-20

Family

ID=15544308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15261879A Pending JPS5674936A (en) 1979-11-22 1979-11-22 Position detection method of semiconductor chip

Country Status (1)

Country Link
JP (1) JPS5674936A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5878640U (en) * 1981-11-24 1983-05-27 株式会社東芝 Holding sheet for semiconductor pellets
JPS5890728A (en) * 1981-11-25 1983-05-30 Nippon Telegr & Teleph Corp <Ntt> Mark for alignment on semiconductor wafer and manufacture thereof
JPS5984835U (en) * 1982-11-29 1984-06-08 日本電気ホームエレクトロニクス株式会社 semiconductor pellets
JPS625107A (en) * 1985-07-01 1987-01-12 Nippon Kogaku Kk <Nikon> Resist pattern measuring apparatus
JPS6242254U (en) * 1985-08-31 1987-03-13
JPS63179203A (en) * 1987-01-20 1988-07-23 Hiyuutec:Kk Corner position detector

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5878640U (en) * 1981-11-24 1983-05-27 株式会社東芝 Holding sheet for semiconductor pellets
JPS5890728A (en) * 1981-11-25 1983-05-30 Nippon Telegr & Teleph Corp <Ntt> Mark for alignment on semiconductor wafer and manufacture thereof
JPS6211491B2 (en) * 1981-11-25 1987-03-12 Nippon Telegraph & Telephone
JPS5984835U (en) * 1982-11-29 1984-06-08 日本電気ホームエレクトロニクス株式会社 semiconductor pellets
JPS625107A (en) * 1985-07-01 1987-01-12 Nippon Kogaku Kk <Nikon> Resist pattern measuring apparatus
JPS6242254U (en) * 1985-08-31 1987-03-13
JPS63179203A (en) * 1987-01-20 1988-07-23 Hiyuutec:Kk Corner position detector

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