JPS57135065A - Applying machine - Google Patents
Applying machineInfo
- Publication number
- JPS57135065A JPS57135065A JP1811081A JP1811081A JPS57135065A JP S57135065 A JPS57135065 A JP S57135065A JP 1811081 A JP1811081 A JP 1811081A JP 1811081 A JP1811081 A JP 1811081A JP S57135065 A JPS57135065 A JP S57135065A
- Authority
- JP
- Japan
- Prior art keywords
- foreign matters
- detector
- mask substrate
- applying machine
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To perform high-speed treatment while inhibiting adherence of foreign matters, by locating a detector, which comprises a laser generator, a laser beam scanning part and a foreign matter-detecting part, to detect the foreign matters adhered to a workpiece at the downstream position of an applying machine.
CONSTITUTION: A mask substrate M, whose surface is coated with a photoresist by an applying machine 2, is passed through a baking oven 4 to a detector 5. At the detector 5, laser beams from a laser generator 7 are irradiated to the whole surface of the mask substrate M by the action of a swinging mirror 9 and a mirror 10. The reflecting light reaches a half mirror 8 along the reversal passage, and is reflected and received by a light receiver 12. In this case, when there are foreign matters on the mask substrate M, regular reflection is hampered and the amount of the reflecting light is reduced. The decrease of the reflected light amount is detected by the light receiver 12, so that the foreign matters can be easily detected.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1811081A JPS57135065A (en) | 1981-02-12 | 1981-02-12 | Applying machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1811081A JPS57135065A (en) | 1981-02-12 | 1981-02-12 | Applying machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57135065A true JPS57135065A (en) | 1982-08-20 |
Family
ID=11962468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1811081A Pending JPS57135065A (en) | 1981-02-12 | 1981-02-12 | Applying machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57135065A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62263646A (en) * | 1986-05-12 | 1987-11-16 | Toshiba Corp | Inspecting device for wafer |
| JPS63261632A (en) * | 1987-04-20 | 1988-10-28 | 日立電線株式会社 | Foreign matter detector for insulation paper for power cable |
| JP2003077828A (en) * | 2001-07-11 | 2003-03-14 | Samsung Electronics Co Ltd | System and method for photolithography process |
-
1981
- 1981-02-12 JP JP1811081A patent/JPS57135065A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62263646A (en) * | 1986-05-12 | 1987-11-16 | Toshiba Corp | Inspecting device for wafer |
| JPS63261632A (en) * | 1987-04-20 | 1988-10-28 | 日立電線株式会社 | Foreign matter detector for insulation paper for power cable |
| JPH0576123B2 (en) * | 1987-04-20 | 1993-10-22 | Hitachi Cable | |
| JP2003077828A (en) * | 2001-07-11 | 2003-03-14 | Samsung Electronics Co Ltd | System and method for photolithography process |
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