JPS5668070A - Pyroelectric image sensor - Google Patents
Pyroelectric image sensorInfo
- Publication number
- JPS5668070A JPS5668070A JP14510779A JP14510779A JPS5668070A JP S5668070 A JPS5668070 A JP S5668070A JP 14510779 A JP14510779 A JP 14510779A JP 14510779 A JP14510779 A JP 14510779A JP S5668070 A JPS5668070 A JP S5668070A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- silicon wafer
- gate electrode
- mos
- constitution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052710 silicon Inorganic materials 0.000 abstract 4
- 239000010703 silicon Substances 0.000 abstract 4
- 238000006243 chemical reaction Methods 0.000 abstract 2
- 239000002131 composite material Substances 0.000 abstract 2
- 239000002033 PVDF binder Substances 0.000 abstract 1
- 239000012790 adhesive layer Substances 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14669—Infrared imagers
Abstract
PURPOSE:To make it possible to obtain a composite pyroelectric element, by arranging plural MOS transistor circuits for impedance conversion, where a part of the small-size electrode is used as a gate electrode, in one silicon wafer to form the element. CONSTITUTION:Common earth electrode 3 is provided on the surface of polyvinylidene fluoride film 2, and integrated MOS transistor chip 5 where the MOS- FET transistor group is arranged is joined onto the opposite surface through adhesive layer 4. In transistor chip 5, the extension part of metal vapor-deposited film electrode 8 provided on oxide film 7 of silicon wafer 6 is used as the gate electrode, and plural impedance conversion MOS transistors 12 constituted by source electrode 10 and drain electrode 11 which are provided in the silicon layer under the gate electrode by the impurity diffusion method are arranged in silicon wafer 6. Composite pyroelectric element 1 has this constitution.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14510779A JPS5668070A (en) | 1979-11-09 | 1979-11-09 | Pyroelectric image sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14510779A JPS5668070A (en) | 1979-11-09 | 1979-11-09 | Pyroelectric image sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5668070A true JPS5668070A (en) | 1981-06-08 |
JPS6366468B2 JPS6366468B2 (en) | 1988-12-20 |
Family
ID=15377533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14510779A Granted JPS5668070A (en) | 1979-11-09 | 1979-11-09 | Pyroelectric image sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5668070A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2795564B2 (en) * | 1991-10-08 | 1998-09-10 | アロカ 株式会社 | Dilution method for highly viscous liquid |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6021781U (en) * | 1983-07-19 | 1985-02-14 | 日本ワ−ドプロセツサ株式会社 | CRT display hood |
-
1979
- 1979-11-09 JP JP14510779A patent/JPS5668070A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6021781U (en) * | 1983-07-19 | 1985-02-14 | 日本ワ−ドプロセツサ株式会社 | CRT display hood |
Also Published As
Publication number | Publication date |
---|---|
JPS6366468B2 (en) | 1988-12-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5539404A (en) | Solid state pickup device | |
JPS5694670A (en) | Complementary type mis semiconductor device | |
JPS5668070A (en) | Pyroelectric image sensor | |
JPS5633881A (en) | Manufacture of semiconductor device | |
JPS5497384A (en) | Semiconductor device | |
JPS5937858B2 (en) | Semiconductor device and its manufacturing method | |
JPS6484663A (en) | Contact-type equi-magnification image sensor | |
JPS5513944A (en) | C-mos semiconductor device | |
JPS54150090A (en) | Manufacture of semiconductor device | |
JPS56150867A (en) | Semiconductor device | |
JPS54101290A (en) | Semiconductor integtated circuit unit and its manufacture | |
JPS6489457A (en) | Manufacture of semiconductor device | |
JPS5443685A (en) | Production of complementary mos integrated circuit unit | |
JPS57166071A (en) | Semiconductor device | |
JPS57153473A (en) | Semiconductor device with input and output protective circuit and its manufacturing method | |
JPS6459862A (en) | Field-effect transistor | |
JPS5683962A (en) | Substrate bias circuit | |
JPS55140261A (en) | Substrate potential generator | |
JPS5487192A (en) | Mis type semiconductor intergrated circuit and its manufacture | |
JPS5323578A (en) | Production of mos type integrated circuit device | |
JPS5360181A (en) | Production of mos type field effect transistor | |
JPS54149482A (en) | Two-way voltage selecting swtching element | |
JPS54155784A (en) | Manufacture of semiconductor integrated-circuit device | |
JPS57196587A (en) | Semiconductor hall element | |
JPS5737879A (en) | Field effect transistor |