JPS5665137A - Preparation of photosensitive resin printing master - Google Patents

Preparation of photosensitive resin printing master

Info

Publication number
JPS5665137A
JPS5665137A JP14083279A JP14083279A JPS5665137A JP S5665137 A JPS5665137 A JP S5665137A JP 14083279 A JP14083279 A JP 14083279A JP 14083279 A JP14083279 A JP 14083279A JP S5665137 A JPS5665137 A JP S5665137A
Authority
JP
Japan
Prior art keywords
roller
substrate
plate
image
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14083279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS631579B2 (enrdf_load_stackoverflow
Inventor
Motoaki Takahashi
Tsutomu Kojima
Akiyoshi Mizuno
Nobuo Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP14083279A priority Critical patent/JPS5665137A/ja
Publication of JPS5665137A publication Critical patent/JPS5665137A/ja
Publication of JPS631579B2 publication Critical patent/JPS631579B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14083279A 1979-10-31 1979-10-31 Preparation of photosensitive resin printing master Granted JPS5665137A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14083279A JPS5665137A (en) 1979-10-31 1979-10-31 Preparation of photosensitive resin printing master

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14083279A JPS5665137A (en) 1979-10-31 1979-10-31 Preparation of photosensitive resin printing master

Publications (2)

Publication Number Publication Date
JPS5665137A true JPS5665137A (en) 1981-06-02
JPS631579B2 JPS631579B2 (enrdf_load_stackoverflow) 1988-01-13

Family

ID=15277747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14083279A Granted JPS5665137A (en) 1979-10-31 1979-10-31 Preparation of photosensitive resin printing master

Country Status (1)

Country Link
JP (1) JPS5665137A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59189341A (ja) * 1983-03-28 1984-10-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 基材上に光硬化した物質の独立部分を形成させる方法
WO2002067058A1 (de) * 2001-02-21 2002-08-29 Siemens Aktiengesellschaft Anordnung zur kontinuierlichen erzeugung eines strukturierten, beschichteten substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59189341A (ja) * 1983-03-28 1984-10-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 基材上に光硬化した物質の独立部分を形成させる方法
WO2002067058A1 (de) * 2001-02-21 2002-08-29 Siemens Aktiengesellschaft Anordnung zur kontinuierlichen erzeugung eines strukturierten, beschichteten substrates

Also Published As

Publication number Publication date
JPS631579B2 (enrdf_load_stackoverflow) 1988-01-13

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