JPS566236A - Photosensitive material and pattern forming method using it - Google Patents

Photosensitive material and pattern forming method using it

Info

Publication number
JPS566236A
JPS566236A JP8165979A JP8165979A JPS566236A JP S566236 A JPS566236 A JP S566236A JP 8165979 A JP8165979 A JP 8165979A JP 8165979 A JP8165979 A JP 8165979A JP S566236 A JPS566236 A JP S566236A
Authority
JP
Japan
Prior art keywords
photosensitive material
compound
quinone
diazide compound
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8165979A
Other languages
English (en)
Other versions
JPS6249614B2 (ja
Inventor
Hiromichi Tachikawa
Yonosuke Takahashi
Fumiaki Shinozaki
Tomoaki Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP8165979A priority Critical patent/JPS566236A/ja
Priority to US06/164,399 priority patent/US4356255A/en
Publication of JPS566236A publication Critical patent/JPS566236A/ja
Publication of JPS6249614B2 publication Critical patent/JPS6249614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8165979A 1979-06-28 1979-06-28 Photosensitive material and pattern forming method using it Granted JPS566236A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8165979A JPS566236A (en) 1979-06-28 1979-06-28 Photosensitive material and pattern forming method using it
US06/164,399 US4356255A (en) 1979-06-28 1980-06-30 Photosensitive members and a process for forming patterns using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8165979A JPS566236A (en) 1979-06-28 1979-06-28 Photosensitive material and pattern forming method using it

Publications (2)

Publication Number Publication Date
JPS566236A true JPS566236A (en) 1981-01-22
JPS6249614B2 JPS6249614B2 (ja) 1987-10-20

Family

ID=13752448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8165979A Granted JPS566236A (en) 1979-06-28 1979-06-28 Photosensitive material and pattern forming method using it

Country Status (2)

Country Link
US (1) US4356255A (ja)
JP (1) JPS566236A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118238A (en) * 1981-01-16 1982-07-23 Konishiroku Photo Ind Co Ltd Positive type photosensitive composition
FR2500645A1 (fr) * 1981-02-20 1982-08-27 Polychrome Corp Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element
JPH02269347A (ja) * 1989-04-10 1990-11-02 Sumitomo Chem Co Ltd フオトレジスト組成物

Families Citing this family (52)

* Cited by examiner, † Cited by third party
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DE3110632A1 (de) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen
US4377633A (en) * 1981-08-24 1983-03-22 International Business Machines Corporation Methods of simultaneous contact and metal lithography patterning
WO1983002339A1 (en) * 1981-12-21 1983-07-07 Molodnyakov, Sergey, Petrovich Photo- and electron resist
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
DE3325023A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
US4650745A (en) * 1985-06-04 1987-03-17 Philip A. Hunt Chemical Corporation Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
GB2224362B (en) * 1988-11-01 1993-05-19 Yamatoya Shokai A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser
JPH02124220U (ja) * 1989-03-23 1990-10-12
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
WO1996039646A1 (en) 1995-06-05 1996-12-12 Kimberly-Clark Worldwide, Inc. Novel pre-dyes
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
CA2221565A1 (en) 1995-06-28 1997-01-16 Kimberly-Clark Worldwide, Inc. Novel colorants and colorant modifiers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
JPH10513502A (ja) 1995-11-28 1998-12-22 キンバリー クラーク ワールドワイド インコーポレイテッド 改良された着色剤安定剤
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
JP3796982B2 (ja) * 1998-06-02 2006-07-12 住友化学株式会社 ポジ型レジスト組成物
EP1062285A2 (en) 1998-06-03 2000-12-27 Kimberly-Clark Worldwide, Inc. Neonanoplasts and microemulsion technology for inks and ink jet printing
PL338379A1 (en) 1998-06-03 2000-10-23 Kimberly Clark Co Novel photoinitiators and their application
EP1100852A1 (en) 1998-07-20 2001-05-23 Kimberly-Clark Worldwide, Inc. Improved ink jet ink compositions
ATE323725T1 (de) 1998-09-28 2006-05-15 Kimberly Clark Co Chelate mit chinoiden gruppen als photoinitiatoren
ES2195869T3 (es) 1999-01-19 2003-12-16 Kimberly Clark Co Nuevos colorantes, estabilizantes de colorantes, compuestos de tinta y metodos mejorados para su fabricacion.
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
JP3739227B2 (ja) * 1999-03-04 2006-01-25 信越化学工業株式会社 フォトレジスト材料およびパターン形成方法
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
KR100772772B1 (ko) 2000-06-19 2007-11-01 킴벌리-클라크 월드와이드, 인크. 신규한 광개시제 및 그의 용도

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE441985A (ja) * 1939-12-27
US2694010A (en) * 1951-11-20 1954-11-09 Gen Aniline & Film Corp Light-sensitive diazotype layers containing magnesium salts
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
US3984250A (en) * 1970-02-12 1976-10-05 Eastman Kodak Company Light-sensitive diazoketone and azide compositions and photographic elements
JPS4918809B1 (ja) * 1970-04-08 1974-05-13
US3844793A (en) * 1970-10-19 1974-10-29 American Cyanamid Co Photosensitive azido material
US4164421A (en) * 1972-12-09 1979-08-14 Fuji Photo Film Co., Ltd. Photocurable composition containing an o-quinonodiazide for printing plate
US4196003A (en) * 1974-02-01 1980-04-01 Fuji Photo Film Co., Ltd. Light-sensitive o-quinone diazide copying composition
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118238A (en) * 1981-01-16 1982-07-23 Konishiroku Photo Ind Co Ltd Positive type photosensitive composition
JPS6358336B2 (ja) * 1981-01-16 1988-11-15 Konishiroku Photo Ind
FR2500645A1 (fr) * 1981-02-20 1982-08-27 Polychrome Corp Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element
JPH02269347A (ja) * 1989-04-10 1990-11-02 Sumitomo Chem Co Ltd フオトレジスト組成物

Also Published As

Publication number Publication date
JPS6249614B2 (ja) 1987-10-20
US4356255A (en) 1982-10-26

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