JPS5660435A - Mask pattern forming method - Google Patents
Mask pattern forming methodInfo
- Publication number
- JPS5660435A JPS5660435A JP13627179A JP13627179A JPS5660435A JP S5660435 A JPS5660435 A JP S5660435A JP 13627179 A JP13627179 A JP 13627179A JP 13627179 A JP13627179 A JP 13627179A JP S5660435 A JPS5660435 A JP S5660435A
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- mask
- substrate
- mask material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
- G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13627179A JPS5660435A (en) | 1979-10-22 | 1979-10-22 | Mask pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13627179A JPS5660435A (en) | 1979-10-22 | 1979-10-22 | Mask pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5660435A true JPS5660435A (en) | 1981-05-25 |
JPS6145823B2 JPS6145823B2 (ar) | 1986-10-09 |
Family
ID=15171283
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13627179A Granted JPS5660435A (en) | 1979-10-22 | 1979-10-22 | Mask pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5660435A (ar) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0331320U (ar) * | 1989-08-03 | 1991-03-27 |
-
1979
- 1979-10-22 JP JP13627179A patent/JPS5660435A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6145823B2 (ar) | 1986-10-09 |
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