JPS5654433A - Functional polymer material and its pattern forming method - Google Patents
Functional polymer material and its pattern forming methodInfo
- Publication number
- JPS5654433A JPS5654433A JP13103479A JP13103479A JPS5654433A JP S5654433 A JPS5654433 A JP S5654433A JP 13103479 A JP13103479 A JP 13103479A JP 13103479 A JP13103479 A JP 13103479A JP S5654433 A JPS5654433 A JP S5654433A
- Authority
- JP
- Japan
- Prior art keywords
- minute pattern
- substrate
- polymer material
- functional polymer
- obtd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Abstract
PURPOSE: To obtain a negative type minute pattern with superior resolution and superior adhesion to the substrate by selectively irradiating a functional polymer material made of novolak type phenol resin with electron beams, X-rays, far ultraviolet rays or the like followed by development with an alkali developer.
CONSTITUTION: A minute pattern for manufacturing a high density integrated circuit, etc. is obtd. as follows: novolak type phenol resin having about 2,000 average mol. wt. and represented by the formula (where R is H or CH3 and (n) is the number of units) is dissolved in methylcellosolve acetate to prepare a 20% soln. This soln. is applied to the surface of a silicon substrate or the like, preheated, irradiated with electron beams, and baked. By developing the irradiated substrate with an org. or inorg. alkali developer to remove the unirradiated part, a negative type minute pattern of about 1μ width is obtd. with accuracy. Since such an aqueous developer and such easily available starting materials are used, the cost can be lowered.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54131034A JPS6055824B2 (en) | 1979-10-11 | 1979-10-11 | Sensitive polymer material and its pattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54131034A JPS6055824B2 (en) | 1979-10-11 | 1979-10-11 | Sensitive polymer material and its pattern formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5654433A true JPS5654433A (en) | 1981-05-14 |
JPS6055824B2 JPS6055824B2 (en) | 1985-12-06 |
Family
ID=15048467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54131034A Expired JPS6055824B2 (en) | 1979-10-11 | 1979-10-11 | Sensitive polymer material and its pattern formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6055824B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5231742A (en) * | 1973-02-12 | 1977-03-10 | Rca Corp | Electronic beam recorder |
-
1979
- 1979-10-11 JP JP54131034A patent/JPS6055824B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5231742A (en) * | 1973-02-12 | 1977-03-10 | Rca Corp | Electronic beam recorder |
Also Published As
Publication number | Publication date |
---|---|
JPS6055824B2 (en) | 1985-12-06 |
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