JPS5654433A - Functional polymer material and its pattern forming method - Google Patents

Functional polymer material and its pattern forming method

Info

Publication number
JPS5654433A
JPS5654433A JP13103479A JP13103479A JPS5654433A JP S5654433 A JPS5654433 A JP S5654433A JP 13103479 A JP13103479 A JP 13103479A JP 13103479 A JP13103479 A JP 13103479A JP S5654433 A JPS5654433 A JP S5654433A
Authority
JP
Japan
Prior art keywords
minute pattern
substrate
polymer material
functional polymer
obtd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13103479A
Other languages
Japanese (ja)
Other versions
JPS6055824B2 (en
Inventor
Kazuo Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP54131034A priority Critical patent/JPS6055824B2/en
Publication of JPS5654433A publication Critical patent/JPS5654433A/en
Publication of JPS6055824B2 publication Critical patent/JPS6055824B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE: To obtain a negative type minute pattern with superior resolution and superior adhesion to the substrate by selectively irradiating a functional polymer material made of novolak type phenol resin with electron beams, X-rays, far ultraviolet rays or the like followed by development with an alkali developer.
CONSTITUTION: A minute pattern for manufacturing a high density integrated circuit, etc. is obtd. as follows: novolak type phenol resin having about 2,000 average mol. wt. and represented by the formula (where R is H or CH3 and (n) is the number of units) is dissolved in methylcellosolve acetate to prepare a 20% soln. This soln. is applied to the surface of a silicon substrate or the like, preheated, irradiated with electron beams, and baked. By developing the irradiated substrate with an org. or inorg. alkali developer to remove the unirradiated part, a negative type minute pattern of about 1μ width is obtd. with accuracy. Since such an aqueous developer and such easily available starting materials are used, the cost can be lowered.
COPYRIGHT: (C)1981,JPO&Japio
JP54131034A 1979-10-11 1979-10-11 Sensitive polymer material and its pattern formation method Expired JPS6055824B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54131034A JPS6055824B2 (en) 1979-10-11 1979-10-11 Sensitive polymer material and its pattern formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54131034A JPS6055824B2 (en) 1979-10-11 1979-10-11 Sensitive polymer material and its pattern formation method

Publications (2)

Publication Number Publication Date
JPS5654433A true JPS5654433A (en) 1981-05-14
JPS6055824B2 JPS6055824B2 (en) 1985-12-06

Family

ID=15048467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54131034A Expired JPS6055824B2 (en) 1979-10-11 1979-10-11 Sensitive polymer material and its pattern formation method

Country Status (1)

Country Link
JP (1) JPS6055824B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5231742A (en) * 1973-02-12 1977-03-10 Rca Corp Electronic beam recorder

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5231742A (en) * 1973-02-12 1977-03-10 Rca Corp Electronic beam recorder

Also Published As

Publication number Publication date
JPS6055824B2 (en) 1985-12-06

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