JPS5652848A - Electron gun structure - Google Patents

Electron gun structure

Info

Publication number
JPS5652848A
JPS5652848A JP12689479A JP12689479A JPS5652848A JP S5652848 A JPS5652848 A JP S5652848A JP 12689479 A JP12689479 A JP 12689479A JP 12689479 A JP12689479 A JP 12689479A JP S5652848 A JPS5652848 A JP S5652848A
Authority
JP
Japan
Prior art keywords
grids
resistor
supporting structure
insulative material
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12689479A
Other languages
Japanese (ja)
Inventor
Eiji Kanbara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12689479A priority Critical patent/JPS5652848A/en
Publication of JPS5652848A publication Critical patent/JPS5652848A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/484—Eliminating deleterious effects due to thermal effects, electrical or magnetic fields; Preventing unwanted emission

Abstract

PURPOSE:To eliminate the spark between projected electrodes by coating the back and side of an electrode supporting structure composed of a resistor and the face for projecting the electrode with insulative material layers. CONSTITUTION:An electrode supporting structure 22 is comprised of a resistor 2a and an insulative material layer 2b coated on said resistor 2a. The insulative material layers 2b are formed on the back and side of third, fourth, fifth and six grids 8, 9, 10, 11 except the face where sections 81, 91, 101 and 111 are projected, while said layers are also formed on the projecting sections 61, 71 of the first and second grids 6, 7 to insulate the first and second grids from the resistor 2a. Then 25kV and 500V are applied through a spring 15 and a stem lead 18. Consequently 7kV is applied on the third and fifth grids to prevent the discharge occurring on the surface of the supporting structure.
JP12689479A 1979-10-03 1979-10-03 Electron gun structure Pending JPS5652848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12689479A JPS5652848A (en) 1979-10-03 1979-10-03 Electron gun structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12689479A JPS5652848A (en) 1979-10-03 1979-10-03 Electron gun structure

Publications (1)

Publication Number Publication Date
JPS5652848A true JPS5652848A (en) 1981-05-12

Family

ID=14946493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12689479A Pending JPS5652848A (en) 1979-10-03 1979-10-03 Electron gun structure

Country Status (1)

Country Link
JP (1) JPS5652848A (en)

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