JPS5652851A - Electron gun structure - Google Patents

Electron gun structure

Info

Publication number
JPS5652851A
JPS5652851A JP12689779A JP12689779A JPS5652851A JP S5652851 A JPS5652851 A JP S5652851A JP 12689779 A JP12689779 A JP 12689779A JP 12689779 A JP12689779 A JP 12689779A JP S5652851 A JPS5652851 A JP S5652851A
Authority
JP
Japan
Prior art keywords
projected
supporting structure
electrode
resistor
material layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12689779A
Other languages
Japanese (ja)
Other versions
JPS6220659B2 (en
Inventor
Eiji Kanbara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12689779A priority Critical patent/JPS5652851A/en
Publication of JPS5652851A publication Critical patent/JPS5652851A/en
Publication of JPS6220659B2 publication Critical patent/JPS6220659B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/484—Eliminating deleterious effects due to thermal effects, electrical or magnetic fields; Preventing unwanted emission

Abstract

PURPOSE:To prevent the superficial discharge of a supporting structure, by coating insulative material layers on the surface of the electrode supporting structure constituted of a resistor at the portion where the focusing electrodes are not projected and where the control and acceleration electrodes are projected. CONSTITUTION:An electrode supporting structure 22 is comprised of a resistor 2a and an insulative material layer 2b coated on said resistor 2a. The insulative material layer 2b is formed except the portions 82, 92, 102 and 112 where focusing electrodes or the third, fourth, fifth and sixth grids 8, 9, 10, 11 are projected, while the portions 61, 71 for projecting the control electrode 6 and the acceleration electrode 7 are projected from the insulating material layer. Then 25kV and 500V are applied through a spring 15 and a stem lead 18. Consequently 7kV is applied across the third and fifth grids to prevent the discharge occurring on the surface of the supporting structure.
JP12689779A 1979-10-03 1979-10-03 Electron gun structure Granted JPS5652851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12689779A JPS5652851A (en) 1979-10-03 1979-10-03 Electron gun structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12689779A JPS5652851A (en) 1979-10-03 1979-10-03 Electron gun structure

Publications (2)

Publication Number Publication Date
JPS5652851A true JPS5652851A (en) 1981-05-12
JPS6220659B2 JPS6220659B2 (en) 1987-05-08

Family

ID=14946575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12689779A Granted JPS5652851A (en) 1979-10-03 1979-10-03 Electron gun structure

Country Status (1)

Country Link
JP (1) JPS5652851A (en)

Also Published As

Publication number Publication date
JPS6220659B2 (en) 1987-05-08

Similar Documents

Publication Publication Date Title
CA2182647A1 (en) Electron-emitting device and electron source and image-forming apparatus using the same as well as method of manufacturing the same
JPS51145390A (en) Manufacturing method of a coated layer of oxygen senser
JPS5367972A (en) Electrode for elctric discharge lamp
JPS53121454A (en) Electron source of thin film electric field emission type and its manufacture
JPS5652851A (en) Electron gun structure
JPS5652849A (en) Electron gun structure
JPS5652848A (en) Electron gun structure
JPS5774948A (en) Electron gun
JPS5652850A (en) Electron gun structure
JPS5357837A (en) Electrostatic recording body
JPS5652852A (en) Electron gun structure
JPS5229164A (en) Electron gun body and its method of production
JPS5661740A (en) Gas discharge panel
JPS541625A (en) Electrostatic recording head pressing mechanism
JPS5465745A (en) Electrostatic powder gun for coating inner surface
JPS55159550A (en) Electron gun structure
JPS5229167A (en) Body of electron gun
JPS52141228A (en) Electrophotography
JPS6415767A (en) Electric discharge device
JPS5345963A (en) Cathode-ray tube
JPS529891A (en) Electrode material for zinc oxide voltage non-linear resistor
JPS52144384A (en) Vacuum evaporation
JPS5652853A (en) Electron gun structure
JPS5795036A (en) Manufacture of image pick-up tube
JPS5663754A (en) Electron-gun unit