JPS6010539A - Cathode structure - Google Patents

Cathode structure

Info

Publication number
JPS6010539A
JPS6010539A JP58117038A JP11703883A JPS6010539A JP S6010539 A JPS6010539 A JP S6010539A JP 58117038 A JP58117038 A JP 58117038A JP 11703883 A JP11703883 A JP 11703883A JP S6010539 A JPS6010539 A JP S6010539A
Authority
JP
Japan
Prior art keywords
layer
density
emitting material
electron emitting
cathode structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58117038A
Other languages
Japanese (ja)
Inventor
Tokihiko Tode
都出 時彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58117038A priority Critical patent/JPS6010539A/en
Publication of JPS6010539A publication Critical patent/JPS6010539A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/13Solid thermionic cathodes
    • H01J1/20Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment

Landscapes

  • Solid Thermionic Cathode (AREA)

Abstract

PURPOSE:To improve the withstanding voltage and life characteristics by providing the first layer densely formed with an electron emitting material in contact with a base metal held at one end of a sleeve, providing the second layer thinly formed on the first layer, and providing the third layer densely formed on the second layer. CONSTITUTION:A cathode structure holds a base metal 2 at the tip of a sleeve, and an electron emitting material layer 50 is deposited and formed on the metal 2. The layer 50 is constituted with the first layer 50-1 densely formed with the electron emitting material in contact with the metal 2, the second layer 50-2 thinly formed with the electron emitting material on the layer 50-1, and the third layer 50-3 densely formed with the electron emitting material on the layer 50-2. Accordingly, a cathode structure excellent in both the withstanding voltage and life characteristics can be obtained.

Description

【発明の詳細な説明】 [発明の技術分野〕 本発明は陰極構体の改良に関する。[Detailed description of the invention] [Technical field of invention] The present invention relates to improvements in cathode structures.

〔発明の技術的背景及びその問題点〕[Technical background of the invention and its problems]

カラーブラウン管その他多くの電子管には酸化物陰極構
体が用いられる。
Oxide cathode structures are used in color cathode ray tubes and many other electron tubes.

従来の酸化物陰極構体の構造は第1図に示すようにスリ
ーブ(1)の先端に基体金属(2)が溶着され、スリー
ブ(1)は3本のストラップ(3)を介してホルダ(4
)に支持されている。基体金属(2)の表面には電子放
射物質層(5)が形成されている。この電子放射物質層
(5)はBaCO3,CaCO3,8rCO8等の炭酸
塩とニトロセルロースと酢酸ブチルよりなる混合液をス
プレーガンにより吹きつけるいわゆるスプレー法により
形成される。このスプレー条件例えば混合液の組成配合
比、スプレーガンの空気流量、ガンから基体金属までの
距離等々によって形成される電子放射物l!!層の表面
状態内面状態が変わり、その結果が陰極の寿命特性や耐
圧特性(カソードと第1ブリッド間の電気的耐圧特性)
に影きようするのでスプレー条件を一定に管理すること
が大切である。
As shown in Figure 1, the structure of a conventional oxide cathode structure is such that a base metal (2) is welded to the tip of a sleeve (1), and the sleeve (1) is attached to a holder (4) via three straps (3).
) is supported. An electron emitting material layer (5) is formed on the surface of the base metal (2). This electron emitting material layer (5) is formed by a so-called spray method in which a liquid mixture of carbonates such as BaCO3, CaCO3, 8rCO8, nitrocellulose, and butyl acetate is sprayed with a spray gun. Electron emitted particles are formed depending on spray conditions such as the composition ratio of the liquid mixture, the air flow rate of the spray gun, the distance from the gun to the base metal, etc. ! The surface and internal conditions of the layer change, and the result changes the life characteristics and voltage resistance characteristics of the cathode (electrical voltage resistance characteristics between the cathode and the first bridge).
Therefore, it is important to control spray conditions at a constant level.

さて種々の技術の蓄積により酸化物陰極の寿命特性、耐
圧特性も改善されてきたか、さらiこ一層の改善が必要
とされている。
Now, with the accumulation of various technologies, the life characteristics and voltage resistance characteristics of oxide cathodes have been improved, and further improvements are required.

[発明の目的〕 本発明は寿命特性、耐圧特性の改善された優れた陰極構
体を提供することを目的とする。
[Object of the Invention] An object of the present invention is to provide an excellent cathode structure with improved life characteristics and pressure resistance characteristics.

〔発明の概要〕[Summary of the invention]

発明者等は上記目的を達成するために種々の実験を行い
、電子放射物質層を高密度層、低密度層、高密度層の順
に形成したものが寿命特性、耐圧特性共に改善できるこ
とを見出し本発明を完成した。
In order to achieve the above object, the inventors conducted various experiments and found that forming the electron emitting material layer in the order of high-density layer, low-density layer, and high-density layer can improve both life characteristics and voltage resistance characteristics. Completed the invention.

−すなわち本発明は、スリーブの一端に保持される基体
金属とこの基体金属の上に被着形成される電子放射物質
層とを有する陰極構体において、前記電子放射物質層は
基体金属に接するよう電子放射物質を高密度に形成した
第1層、この第1層上に電子放射物質を低密度に形成し
た第2層および第2層上に電子放射物質を高密度に形成
した第3層よりなることを特徴とする陰極構体である。
- That is, the present invention provides a cathode assembly having a base metal held at one end of a sleeve and an electron emissive material layer deposited on the base metal, wherein the electron emissive material layer is in contact with the base metal. Consisting of a first layer in which a radiation material is formed in a high density, a second layer in which an electron radiation material is formed in a low density on the first layer, and a third layer in which an electron radiation material is formed in a high density on the second layer. This is a cathode structure characterized by the following.

本発明の高密度層、低密度層を電子放射物質の密度で例
示するならば、高密度層は4〜1.6 p/cyx 。
If the high-density layer and low-density layer of the present invention are exemplified by the density of the electron emitting material, the high-density layer has a density of 4 to 1.6 p/cyx.

低暫度層は1.0〜1.2v^32層厚さは高密度層は
3〜15μm、低密度層は45〜60μm程度が好まし
い。
The low density layer preferably has a thickness of 1.0 to 1.2V^32, the high density layer preferably has a thickness of 3 to 15 μm, and the low density layer has a thickness of approximately 45 to 60 μm.

し発明の実施例〕 本発明に係る陰極構体の電子放射物質層(50)近傍の
拡大図で、基体金属(2)の上に高密度の第1層(50
−1) 、その上に低密度の第2層(50−2) 、最
上部に高密度の第3層(50−3)を形成している。
Embodiments of the Invention] This is an enlarged view of the vicinity of the electron emissive material layer (50) of the cathode assembly according to the present invention, in which a high-density first layer (50
-1), a low-density second layer (50-2) is formed thereon, and a high-density third layer (50-3) is formed on top.

スプレーガンからチャックに並らべられだ基体金属表面
までの距離を110Mとし、前述と同じ混合液を用いて
液の噴出量を0.2cc/sとしその他の条件を従来品
(密度1.1〜1.3)AI)と同一にし、塗布層10
μIIIの対層を得る。密度は1.552/に♂である
。次lこスプレーガンから基体金属表面までの距離を1
70露とし、同じ混合液を用いて液の噴出量を0.4c
c/sとし、その他の条件を従来品と同一にし、塗布層
50μmの棺2層を得る。密度は1.1y、4’である
。前記第1層と同じ条件で塗布厚10μmの第3層をイ
qる。密度は1.5y、43である。
The distance from the spray gun to the surface of the base metal arranged on the chuck was 110M, the same liquid mixture as above was used, the liquid ejection rate was 0.2cc/s, and the other conditions were the conventional product (density 1.1). ~1.3) Same as AI), coating layer 10
Obtain a counterlayer of μIII. The density is 1.552/male. Next, the distance from the spray gun to the base metal surface is 1
70 dew, and using the same mixed liquid, the amount of liquid jetted was 0.4c.
c/s, and the other conditions were the same as those of the conventional product, to obtain two coffin layers with a coating layer of 50 μm. The density is 1.1y, 4'. A third layer with a coating thickness of 10 μm is formed under the same conditions as the first layer. The density is 1.5y, 43.

同時に従来品を作る。同[混合液を用いスプレーガンか
ら基体金属表面までの距離を170 gll液の噴出量
を0.45cc/sとしその他の条件を実施例と同じに
して塗布厚70μmの陰極構体を得る。
At the same time, we make conventional products. Using the same mixture, the distance from the spray gun to the base metal surface was 170 gll, and the ejection rate of the liquid was 0.45 cc/s, and the other conditions were the same as in the example to obtain a cathode structure with a coating thickness of 70 μm.

第3図には本発明及び従来の陰極構体の耐圧特試駁特性
を示す。耐圧特性は陰極構体を第1格子電極に正規に組
込んだとき陰極と第1格子電極との間に直流高電圧を印
加昇圧(陰極側をプラス、ヒータ不点灯)していき、絶
縁が破からしたときさせたとき、各時間におけるエミッ
ションの初期エミッションに対する割合をエミッション
能力と称している。
FIG. 3 shows the voltage resistance test characteristics of the cathode structure of the present invention and the conventional cathode structure. The breakdown voltage characteristic is that when the cathode assembly is properly assembled into the first grid electrode, a DC high voltage is applied between the cathode and the first grid electrode and the pressure is increased (positive on the cathode side, heater not lit), and the insulation is broken. The ratio of the emission to the initial emission at each time is called the emission capacity.

図に示す通り、耐圧特性、寿命特性共、本発明の陰極構
体の方が優れている。
As shown in the figure, the cathode structure of the present invention is superior in both pressure resistance characteristics and life characteristics.

上記実施例は第1層、第2層および第3層の密度が1.
2 、1.5 、1.2 (fI声3)の場合であった
が、第1層、第3層の密度は1.4〜1.6 y/4s
の範囲内、第2治の密度は1.0〜1.2y7at? 
の範囲内であればよかった。
In the above embodiment, the density of the first layer, second layer and third layer is 1.
2, 1.5, 1.2 (fI voice 3), but the density of the first and third layers was 1.4 to 1.6 y/4s.
Within the range of , the density of the second layer is 1.0 to 1.2y7at?
It would be good if it was within the range.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の陰極構体の概略断面図、第2図は本発明
の陰極構体の電子放射物質層近傍の拡大図、第3図は本
発明及び従来の陰極構体の耐圧特性図、第4図は本発明
及び従来の陰極構体の寿命特性図である。 代理人 弁理士 則 近 憲 佑 (ほか1名)第1図 第 3 図
FIG. 1 is a schematic sectional view of a conventional cathode structure, FIG. 2 is an enlarged view of the vicinity of the electron emitting material layer of the cathode structure of the present invention, FIG. 3 is a breakdown voltage characteristic diagram of the cathode structure of the present invention and the conventional cathode structure, and FIG. The figure is a life characteristic diagram of the present invention and a conventional cathode assembly. Agent Patent Attorney Kensuke Chika (and 1 other person) Figure 1 Figure 3

Claims (1)

【特許請求の範囲】[Claims] スリーブの一端に保持される基体金属と、この基体金属
の上に被着形成される電子放射物質層とを有する陰極構
体において、前記電子放射物質層は基体金属に接するよ
う電子放射物質を高密mlに形成した第1層、この第1
層上に電子放射物質を低密度に形成した第2層およびこ
の第2層上に電子放射物質を高密度に形成した第3層よ
りなることを特徴とする陰極構体。
In a cathode structure having a base metal held at one end of a sleeve and an electron emissive material layer deposited on the base metal, the electron emissive material layer is made of a high-density ml of electron emissive material in contact with the base metal. The first layer formed on
A cathode structure comprising a second layer on which an electron emitting material is formed at a low density, and a third layer on which an electron emitting material is formed at a high density on the second layer.
JP58117038A 1983-06-30 1983-06-30 Cathode structure Pending JPS6010539A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58117038A JPS6010539A (en) 1983-06-30 1983-06-30 Cathode structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58117038A JPS6010539A (en) 1983-06-30 1983-06-30 Cathode structure

Publications (1)

Publication Number Publication Date
JPS6010539A true JPS6010539A (en) 1985-01-19

Family

ID=14701894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58117038A Pending JPS6010539A (en) 1983-06-30 1983-06-30 Cathode structure

Country Status (1)

Country Link
JP (1) JPS6010539A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6317942A (en) * 1986-07-09 1988-01-25 Dainippon Ink & Chem Inc Composition for vinyl chloride resin foam
FR2677169A1 (en) * 1991-05-31 1992-12-04 Thomson Tubes Electroniques OXIDE CATHODE AND METHOD OF MANUFACTURE.
JPH0538751U (en) * 1991-10-29 1993-05-25 関西日本電気株式会社 Cathode structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6317942A (en) * 1986-07-09 1988-01-25 Dainippon Ink & Chem Inc Composition for vinyl chloride resin foam
JPH0564980B2 (en) * 1986-07-09 1993-09-16 Dainippon Ink & Chemicals
FR2677169A1 (en) * 1991-05-31 1992-12-04 Thomson Tubes Electroniques OXIDE CATHODE AND METHOD OF MANUFACTURE.
JPH0538751U (en) * 1991-10-29 1993-05-25 関西日本電気株式会社 Cathode structure

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