JPS5651866A - Electric field effect type thyrister and driving method thereof - Google Patents

Electric field effect type thyrister and driving method thereof

Info

Publication number
JPS5651866A
JPS5651866A JP12795779A JP12795779A JPS5651866A JP S5651866 A JPS5651866 A JP S5651866A JP 12795779 A JP12795779 A JP 12795779A JP 12795779 A JP12795779 A JP 12795779A JP S5651866 A JPS5651866 A JP S5651866A
Authority
JP
Japan
Prior art keywords
layer
gate
base
electrode
scr
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12795779A
Other languages
Japanese (ja)
Inventor
Yoshio Terasawa
Saburo Oikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12795779A priority Critical patent/JPS5651866A/en
Publication of JPS5651866A publication Critical patent/JPS5651866A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)

Abstract

PURPOSE:To make it possible to ignite at a positive low gate bias, by providing locally an n type base layer in such a manner as to pierce a sheetlike p type embedded gate layer having impurity concentration of less than 1X10<18>cm<-3> and leaving it usually in pinch-off position in a depletion layer between gate and base. CONSTITUTION:An n<-> epitaxial base layer 121 is made on a p<+> layer 11, the sheetlike p gate layer 14 whose concentration is less than 1X10<18>cm<-3> is embedded, and an n epitaxial layer 122 is put on it. The layer 122 is etched, an electrode 17 is attached to the gate layer 14, an n<+> layer 13 is provided on the n base 122, an electrode 16 is attached and protected by an insulation film 19. An n<+> layer 111 is selectively formed in such a manner as to pierce the p<+> layer 11, and the p-n junction is shortcircuited by an electrode 15 to shorten ignition time. By making adjustments of thickness and interval of the gate layer 14 and base concentration in the neighborhood of this layer, it is possible to pinch off the channel in absence of the gate bias. When forward voltage is impressed between the positive gate and the cathode 16 and carrier is injected to the channel, the carrier is dispersed in an adjoining SCR structure and an entire aria of the SCR junction is ignited in a moment. It is possible, by using this structure, to obtain the electric field effective type SCR of low ON resistance, high tension resistance and large current.
JP12795779A 1979-10-05 1979-10-05 Electric field effect type thyrister and driving method thereof Pending JPS5651866A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12795779A JPS5651866A (en) 1979-10-05 1979-10-05 Electric field effect type thyrister and driving method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12795779A JPS5651866A (en) 1979-10-05 1979-10-05 Electric field effect type thyrister and driving method thereof

Publications (1)

Publication Number Publication Date
JPS5651866A true JPS5651866A (en) 1981-05-09

Family

ID=14972831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12795779A Pending JPS5651866A (en) 1979-10-05 1979-10-05 Electric field effect type thyrister and driving method thereof

Country Status (1)

Country Link
JP (1) JPS5651866A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5250175A (en) * 1975-10-20 1977-04-21 Semiconductor Res Found Electrostatic induction type thyristor
JPS5422179A (en) * 1977-07-20 1979-02-19 Hitachi Ltd Semiconductor switching element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5250175A (en) * 1975-10-20 1977-04-21 Semiconductor Res Found Electrostatic induction type thyristor
JPS5422179A (en) * 1977-07-20 1979-02-19 Hitachi Ltd Semiconductor switching element

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