JPS5651738A - Minute pattern forming method - Google Patents

Minute pattern forming method

Info

Publication number
JPS5651738A
JPS5651738A JP12675779A JP12675779A JPS5651738A JP S5651738 A JPS5651738 A JP S5651738A JP 12675779 A JP12675779 A JP 12675779A JP 12675779 A JP12675779 A JP 12675779A JP S5651738 A JPS5651738 A JP S5651738A
Authority
JP
Japan
Prior art keywords
resist layer
ultraviolet rays
pattern
layer
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12675779A
Other languages
English (en)
Other versions
JPS6411938B2 (ja
Inventor
Ken Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP12675779A priority Critical patent/JPS5651738A/ja
Publication of JPS5651738A publication Critical patent/JPS5651738A/ja
Publication of JPS6411938B2 publication Critical patent/JPS6411938B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12675779A 1979-10-03 1979-10-03 Minute pattern forming method Granted JPS5651738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12675779A JPS5651738A (en) 1979-10-03 1979-10-03 Minute pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12675779A JPS5651738A (en) 1979-10-03 1979-10-03 Minute pattern forming method

Publications (2)

Publication Number Publication Date
JPS5651738A true JPS5651738A (en) 1981-05-09
JPS6411938B2 JPS6411938B2 (ja) 1989-02-27

Family

ID=14943159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12675779A Granted JPS5651738A (en) 1979-10-03 1979-10-03 Minute pattern forming method

Country Status (1)

Country Link
JP (1) JPS5651738A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60230650A (ja) * 1984-04-30 1985-11-16 Shimadzu Corp 微細パタ−ンの製作法
US5330862A (en) * 1991-06-07 1994-07-19 Sharp Kabushiki Kaisha Method for forming resist mask pattern by light exposure having a phase shifter pattern comprising convex forms in the resist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60230650A (ja) * 1984-04-30 1985-11-16 Shimadzu Corp 微細パタ−ンの製作法
US5330862A (en) * 1991-06-07 1994-07-19 Sharp Kabushiki Kaisha Method for forming resist mask pattern by light exposure having a phase shifter pattern comprising convex forms in the resist

Also Published As

Publication number Publication date
JPS6411938B2 (ja) 1989-02-27

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