JPS5648099A - Electrode for generating plasma for sheet type plasma reaction processor - Google Patents
Electrode for generating plasma for sheet type plasma reaction processorInfo
- Publication number
- JPS5648099A JPS5648099A JP12280279A JP12280279A JPS5648099A JP S5648099 A JPS5648099 A JP S5648099A JP 12280279 A JP12280279 A JP 12280279A JP 12280279 A JP12280279 A JP 12280279A JP S5648099 A JPS5648099 A JP S5648099A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- sheet type
- plasma
- reaction processor
- generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12280279A JPS5648099A (en) | 1979-09-25 | 1979-09-25 | Electrode for generating plasma for sheet type plasma reaction processor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12280279A JPS5648099A (en) | 1979-09-25 | 1979-09-25 | Electrode for generating plasma for sheet type plasma reaction processor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5648099A true JPS5648099A (en) | 1981-05-01 |
JPH0241167B2 JPH0241167B2 (ja) | 1990-09-14 |
Family
ID=14844990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12280279A Granted JPS5648099A (en) | 1979-09-25 | 1979-09-25 | Electrode for generating plasma for sheet type plasma reaction processor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5648099A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57167630A (en) * | 1981-03-13 | 1982-10-15 | Fujitsu Ltd | Plasma vapor-phase growing device |
JPS5950622A (ja) * | 1982-09-17 | 1984-03-23 | Sony Corp | ラジオ受像機 |
JPS63146644A (ja) * | 1986-12-10 | 1988-06-18 | Fujitsu Ltd | Agc方式 |
JPH07130711A (ja) * | 1993-11-02 | 1995-05-19 | Nec Corp | 半導体装置の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52123173A (en) * | 1976-04-08 | 1977-10-17 | Fuji Photo Film Co Ltd | Sputter etching method |
JPS5329672A (en) * | 1976-08-31 | 1978-03-20 | Toshiba Corp | Gas etching apparatus |
-
1979
- 1979-09-25 JP JP12280279A patent/JPS5648099A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52123173A (en) * | 1976-04-08 | 1977-10-17 | Fuji Photo Film Co Ltd | Sputter etching method |
JPS5329672A (en) * | 1976-08-31 | 1978-03-20 | Toshiba Corp | Gas etching apparatus |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57167630A (en) * | 1981-03-13 | 1982-10-15 | Fujitsu Ltd | Plasma vapor-phase growing device |
JPS5950622A (ja) * | 1982-09-17 | 1984-03-23 | Sony Corp | ラジオ受像機 |
JPS63146644A (ja) * | 1986-12-10 | 1988-06-18 | Fujitsu Ltd | Agc方式 |
JPH07130711A (ja) * | 1993-11-02 | 1995-05-19 | Nec Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0241167B2 (ja) | 1990-09-14 |
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