JPS5648099A - Electrode for generating plasma for sheet type plasma reaction processor - Google Patents

Electrode for generating plasma for sheet type plasma reaction processor

Info

Publication number
JPS5648099A
JPS5648099A JP12280279A JP12280279A JPS5648099A JP S5648099 A JPS5648099 A JP S5648099A JP 12280279 A JP12280279 A JP 12280279A JP 12280279 A JP12280279 A JP 12280279A JP S5648099 A JPS5648099 A JP S5648099A
Authority
JP
Japan
Prior art keywords
electrode
sheet type
plasma
reaction processor
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12280279A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0241167B2 (cg-RX-API-DMAC7.html
Inventor
Isamu Hijikata
Akira Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP12280279A priority Critical patent/JPS5648099A/ja
Publication of JPS5648099A publication Critical patent/JPS5648099A/ja
Publication of JPH0241167B2 publication Critical patent/JPH0241167B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP12280279A 1979-09-25 1979-09-25 Electrode for generating plasma for sheet type plasma reaction processor Granted JPS5648099A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12280279A JPS5648099A (en) 1979-09-25 1979-09-25 Electrode for generating plasma for sheet type plasma reaction processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12280279A JPS5648099A (en) 1979-09-25 1979-09-25 Electrode for generating plasma for sheet type plasma reaction processor

Publications (2)

Publication Number Publication Date
JPS5648099A true JPS5648099A (en) 1981-05-01
JPH0241167B2 JPH0241167B2 (cg-RX-API-DMAC7.html) 1990-09-14

Family

ID=14844990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12280279A Granted JPS5648099A (en) 1979-09-25 1979-09-25 Electrode for generating plasma for sheet type plasma reaction processor

Country Status (1)

Country Link
JP (1) JPS5648099A (cg-RX-API-DMAC7.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167630A (en) * 1981-03-13 1982-10-15 Fujitsu Ltd Plasma vapor-phase growing device
JPS5950622A (ja) * 1982-09-17 1984-03-23 Sony Corp ラジオ受像機
JPS63146644A (ja) * 1986-12-10 1988-06-18 Fujitsu Ltd Ａｇｃ方式
JPH07130711A (ja) * 1993-11-02 1995-05-19 Nec Corp 半導体装置の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52123173A (en) * 1976-04-08 1977-10-17 Fuji Photo Film Co Ltd Sputter etching method
JPS5329672A (en) * 1976-08-31 1978-03-20 Toshiba Corp Gas etching apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52123173A (en) * 1976-04-08 1977-10-17 Fuji Photo Film Co Ltd Sputter etching method
JPS5329672A (en) * 1976-08-31 1978-03-20 Toshiba Corp Gas etching apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167630A (en) * 1981-03-13 1982-10-15 Fujitsu Ltd Plasma vapor-phase growing device
JPS5950622A (ja) * 1982-09-17 1984-03-23 Sony Corp ラジオ受像機
JPS63146644A (ja) * 1986-12-10 1988-06-18 Fujitsu Ltd Ａｇｃ方式
JPH07130711A (ja) * 1993-11-02 1995-05-19 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0241167B2 (cg-RX-API-DMAC7.html) 1990-09-14

Similar Documents

Publication Publication Date Title
JPS5448172A (en) Plasma reaction processor
JPS55154585A (en) Plasma reactor
GB2030830B (en) Plasma torch
JPS5633489A (en) Electrode for electrolysis
JPS5421175A (en) Improvement of plasma reaction processor
JPS5451940A (en) Plasma torch unit
GB2021822B (en) Plasma torch apparatus
PH19700A (en) Cathode for generating a plasma
DE3061200D1 (en) Process for baking carbon electrodes
JPS5329285A (en) Plasma reactor
JPS5278676A (en) Electrode for electrolytic reaction
DE3060990D1 (en) Direct current plasma torch
IL56621A (en) Electrocatalytically active electrodes
AU541149B2 (en) Hydrogen evolution electrode
GB2055329B (en) Plasma etcher
JPS551017A (en) Torch for generating transfer type plasma jet
JPS55124996A (en) Electrode unit
JPS53142988A (en) Multiielectron beam type vapor generating apparatus
JPS5648099A (en) Electrode for generating plasma for sheet type plasma reaction processor
GB2006943B (en) Waste gas dispersion stack
GB2015579B (en) Cathode for an electrolyser
JPS5549897A (en) Plasma controller
JPS52120246A (en) Process for welding multiilayered sheet structure
JPS5638799A (en) Plasma torch
JPS56164489A (en) Sheets processor