JPS5637306B2 - - Google Patents
Info
- Publication number
- JPS5637306B2 JPS5637306B2 JP1225079A JP1225079A JPS5637306B2 JP S5637306 B2 JPS5637306 B2 JP S5637306B2 JP 1225079 A JP1225079 A JP 1225079A JP 1225079 A JP1225079 A JP 1225079A JP S5637306 B2 JPS5637306 B2 JP S5637306B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1225079A JPS55107780A (en) | 1979-02-07 | 1979-02-07 | Etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1225079A JPS55107780A (en) | 1979-02-07 | 1979-02-07 | Etching method |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7289983A Division JPS58194341A (ja) | 1983-04-27 | 1983-04-27 | エツチング方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55107780A JPS55107780A (en) | 1980-08-19 |
JPS5637306B2 true JPS5637306B2 (xx) | 1981-08-29 |
Family
ID=11800110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1225079A Granted JPS55107780A (en) | 1979-02-07 | 1979-02-07 | Etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55107780A (xx) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210054699A (ko) * | 2019-11-06 | 2021-05-14 | 한국자동차연구원 | 에너지 회생 장치 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4090437T1 (de) * | 1989-03-24 | 1997-07-24 | Hitachi Ltd | Belichtungsverfahren und -vorrichtung mit einem Strahl geladener Teilchen sowie Aperturblende und Herstellverfahren einer solchen |
US5334845A (en) * | 1989-03-24 | 1994-08-02 | Hitachi Limited | Charged beam exposure method and apparatus as well as aperture stop and production method thereof |
JPH07169756A (ja) * | 1994-11-07 | 1995-07-04 | Semiconductor Energy Lab Co Ltd | プラズマエッチング方法 |
JPH08306675A (ja) * | 1996-05-13 | 1996-11-22 | Semiconductor Energy Lab Co Ltd | プラズマエッチング方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
JPS529648A (en) * | 1975-07-09 | 1977-01-25 | Ibm | Method of selectively ionnetching silicon |
US4104086A (en) * | 1977-08-15 | 1978-08-01 | International Business Machines Corporation | Method for forming isolated regions of silicon utilizing reactive ion etching |
JPS53135843A (en) * | 1977-05-02 | 1978-11-27 | Hitachi Ltd | Etching process for al and al alloy |
JPS541245A (en) * | 1977-06-06 | 1979-01-08 | Hitachi Ltd | Method of etching a1 and a1-based alloy |
-
1979
- 1979-02-07 JP JP1225079A patent/JPS55107780A/ja active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
JPS529648A (en) * | 1975-07-09 | 1977-01-25 | Ibm | Method of selectively ionnetching silicon |
JPS53135843A (en) * | 1977-05-02 | 1978-11-27 | Hitachi Ltd | Etching process for al and al alloy |
JPS541245A (en) * | 1977-06-06 | 1979-01-08 | Hitachi Ltd | Method of etching a1 and a1-based alloy |
US4104086A (en) * | 1977-08-15 | 1978-08-01 | International Business Machines Corporation | Method for forming isolated regions of silicon utilizing reactive ion etching |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210054699A (ko) * | 2019-11-06 | 2021-05-14 | 한국자동차연구원 | 에너지 회생 장치 |
Also Published As
Publication number | Publication date |
---|---|
JPS55107780A (en) | 1980-08-19 |