JPS563618A - Skid mark removing method in continuous heating furnace - Google Patents

Skid mark removing method in continuous heating furnace

Info

Publication number
JPS563618A
JPS563618A JP7856879A JP7856879A JPS563618A JP S563618 A JPS563618 A JP S563618A JP 7856879 A JP7856879 A JP 7856879A JP 7856879 A JP7856879 A JP 7856879A JP S563618 A JPS563618 A JP S563618A
Authority
JP
Japan
Prior art keywords
combustion chamber
steel materials
burners
load
continuous heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7856879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5754529B2 (ref
Inventor
Toshihiro Okochi
Kozo Sekiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP7856879A priority Critical patent/JPS563618A/ja
Publication of JPS563618A publication Critical patent/JPS563618A/ja
Publication of JPS5754529B2 publication Critical patent/JPS5754529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/0081—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for slabs; for billets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
JP7856879A 1979-06-21 1979-06-21 Skid mark removing method in continuous heating furnace Granted JPS563618A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7856879A JPS563618A (en) 1979-06-21 1979-06-21 Skid mark removing method in continuous heating furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7856879A JPS563618A (en) 1979-06-21 1979-06-21 Skid mark removing method in continuous heating furnace

Publications (2)

Publication Number Publication Date
JPS563618A true JPS563618A (en) 1981-01-14
JPS5754529B2 JPS5754529B2 (ref) 1982-11-18

Family

ID=13665489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7856879A Granted JPS563618A (en) 1979-06-21 1979-06-21 Skid mark removing method in continuous heating furnace

Country Status (1)

Country Link
JP (1) JPS563618A (ref)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405733A (en) * 1992-05-12 1995-04-11 Apple Computer, Inc. Multiple beam laser exposure system for liquid crystal shutters
US5695894A (en) * 1993-05-24 1997-12-09 Holtronic Technologies Ltd. Method and apparatus for changing the scale of a pattern printed from a total internal reflection hologram

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405733A (en) * 1992-05-12 1995-04-11 Apple Computer, Inc. Multiple beam laser exposure system for liquid crystal shutters
US5695894A (en) * 1993-05-24 1997-12-09 Holtronic Technologies Ltd. Method and apparatus for changing the scale of a pattern printed from a total internal reflection hologram

Also Published As

Publication number Publication date
JPS5754529B2 (ref) 1982-11-18

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