JPS5636135A - Manufacture of resist image - Google Patents

Manufacture of resist image

Info

Publication number
JPS5636135A
JPS5636135A JP11254679A JP11254679A JPS5636135A JP S5636135 A JPS5636135 A JP S5636135A JP 11254679 A JP11254679 A JP 11254679A JP 11254679 A JP11254679 A JP 11254679A JP S5636135 A JPS5636135 A JP S5636135A
Authority
JP
Japan
Prior art keywords
polystyrene
rays
exposed
tetrahydrofuran
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11254679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6154246B2 (enrdf_load_stackoverflow
Inventor
Yoshitake Onishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP11254679A priority Critical patent/JPS5636135A/ja
Publication of JPS5636135A publication Critical patent/JPS5636135A/ja
Publication of JPS6154246B2 publication Critical patent/JPS6154246B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
JP11254679A 1979-09-03 1979-09-03 Manufacture of resist image Granted JPS5636135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11254679A JPS5636135A (en) 1979-09-03 1979-09-03 Manufacture of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11254679A JPS5636135A (en) 1979-09-03 1979-09-03 Manufacture of resist image

Publications (2)

Publication Number Publication Date
JPS5636135A true JPS5636135A (en) 1981-04-09
JPS6154246B2 JPS6154246B2 (enrdf_load_stackoverflow) 1986-11-21

Family

ID=14589352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11254679A Granted JPS5636135A (en) 1979-09-03 1979-09-03 Manufacture of resist image

Country Status (1)

Country Link
JP (1) JPS5636135A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6154246B2 (enrdf_load_stackoverflow) 1986-11-21

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