JPS5635490A - Semiconductor laser element - Google Patents

Semiconductor laser element

Info

Publication number
JPS5635490A
JPS5635490A JP11121579A JP11121579A JPS5635490A JP S5635490 A JPS5635490 A JP S5635490A JP 11121579 A JP11121579 A JP 11121579A JP 11121579 A JP11121579 A JP 11121579A JP S5635490 A JPS5635490 A JP S5635490A
Authority
JP
Japan
Prior art keywords
active layer
layer
laser element
type
gaalas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11121579A
Other languages
Japanese (ja)
Inventor
Morichika Yano
Saburo Yamamoto
Yukio Kurata
Kaneki Matsui
Toshiro Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP11121579A priority Critical patent/JPS5635490A/en
Publication of JPS5635490A publication Critical patent/JPS5635490A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To largely improve the operation lifetime of the laser element by controlling the density of P added to a GaAlAs active layer and thus alleviating the discordance of the lattice constant thereof. CONSTITUTION:The lifetime of the laser depends upon a slight lattice constant difference at the time of hetero epitaxial growth, a slight lattice constance variation caused by doping, and strains introduced by the mounting of electrodes and heat dissipating plate thereon. An N type GaAlAs layer and a P type GaAlAs active layer, a p type GaAlAs layer and a p type GaAs layer are sequentially laminated on an N type GaAs substrate, the addition of P to the active layer is controlled, crystal defect is prevented at the time of growing the active layer, lattice distortion thereof is prevented at room temperature, and the deterioration of a laser element can be remarkably suppressed.
JP11121579A 1979-08-30 1979-08-30 Semiconductor laser element Pending JPS5635490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11121579A JPS5635490A (en) 1979-08-30 1979-08-30 Semiconductor laser element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11121579A JPS5635490A (en) 1979-08-30 1979-08-30 Semiconductor laser element

Publications (1)

Publication Number Publication Date
JPS5635490A true JPS5635490A (en) 1981-04-08

Family

ID=14555434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11121579A Pending JPS5635490A (en) 1979-08-30 1979-08-30 Semiconductor laser element

Country Status (1)

Country Link
JP (1) JPS5635490A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112072467A (en) * 2019-06-11 2020-12-11 全新光电科技股份有限公司 Semiconductor laser diode
CN112242642A (en) * 2019-07-19 2021-01-19 全新光电科技股份有限公司 Vertical cavity surface emitting laser diode (VCSEL) including AlGaAsP layer with compressive stress

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112072467A (en) * 2019-06-11 2020-12-11 全新光电科技股份有限公司 Semiconductor laser diode
CN112242642A (en) * 2019-07-19 2021-01-19 全新光电科技股份有限公司 Vertical cavity surface emitting laser diode (VCSEL) including AlGaAsP layer with compressive stress
US11721954B2 (en) 2019-07-19 2023-08-08 Visual Photonics Epitaxy Co., Ltd. Vertical cavity surface emitting laser diode (VCSEL) having AlGaAsP layer with compressive strain

Similar Documents

Publication Publication Date Title
JPS5696834A (en) Compound semiconductor epitaxial wafer and manufacture thereof
US4095331A (en) Fabrication of an epitaxial layer diode in aluminum nitride on sapphire
IE34306B1 (en) Improvements in method for forming epitaxial crystals or wafers in selected regions of substrates
JPS6076118A (en) Method of producing semiconductor device
JPH0794420A (en) Manufacture of compound semiconductor crystal substrate
JPS5635490A (en) Semiconductor laser element
JPS5946414B2 (en) compound semiconductor device
JPS5635489A (en) Semiconductor laser element
JPS54152879A (en) Structure of semiconductor laser element and its manufacture
JPS57128092A (en) Imbedded type semiconductor laser device
JPH0249422A (en) Manufacture of silicon carbide semiconductor device
JPS57187936A (en) Manufacture of 3-5 family compound semiconductor element
JPS5724591A (en) Manufacture of semiconductor laser device
JPS5656626A (en) Manufacture of 3-5 group compound semiconductor thin film
JP2534945B2 (en) Method for manufacturing semiconductor device
JPS55165688A (en) Preparation of light emission semiconductor device
JPS6232609B2 (en)
JPH0142144B2 (en)
JPH0666335B2 (en) Method for manufacturing silicon carbide Schottky junction field effect transistor
JPS55165689A (en) Preparation of light emission semiconductor device
JPS57194589A (en) Semiconductor laser device
JPS5636175A (en) Light emission semiconductor element
JPS57106117A (en) Method for liquid phase epitaxial growth
JPS5664430A (en) Multiple hetero junction and manufacture thereof
JPH0467676A (en) Manufacture of compound semiconductor device