JPS5635134A - Image forming composition - Google Patents

Image forming composition

Info

Publication number
JPS5635134A
JPS5635134A JP11225580A JP11225580A JPS5635134A JP S5635134 A JPS5635134 A JP S5635134A JP 11225580 A JP11225580 A JP 11225580A JP 11225580 A JP11225580 A JP 11225580A JP S5635134 A JPS5635134 A JP S5635134A
Authority
JP
Japan
Prior art keywords
image forming
forming composition
composition
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11225580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS632099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Deizauaa Rorufu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5635134A publication Critical patent/JPS5635134A/ja
Publication of JPS632099B2 publication Critical patent/JPS632099B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
JP11225580A 1979-08-14 1980-08-14 Image forming composition Granted JPS5635134A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/066,373 US4252887A (en) 1979-08-14 1979-08-14 Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators

Publications (2)

Publication Number Publication Date
JPS5635134A true JPS5635134A (en) 1981-04-07
JPS632099B2 JPS632099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-01-16

Family

ID=22069099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11225580A Granted JPS5635134A (en) 1979-08-14 1980-08-14 Image forming composition

Country Status (5)

Country Link
US (1) US4252887A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0024629B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5635134A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1137348A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3066051D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59140447A (ja) * 1983-02-01 1984-08-11 Hodogaya Chem Co Ltd 感光性組成物
JPS59227264A (ja) * 1983-05-26 1984-12-20 ソシエテ・デ・プロデユイ・ネツスル・ソシエテ・アノニム 野菜パスタの製造方法
JPS6355539A (ja) * 1986-05-30 1988-03-10 Toyobo Co Ltd 画像形成材料および画像形成方法
JP2007011046A (ja) * 2005-06-30 2007-01-18 Fujifilm Holdings Corp 感光性組成物および画像記録材料並びに画像記録方法
US7645561B1 (en) 1997-09-19 2010-01-12 Hitachi Chemical Company, Ltd. Photosensitive film
CN102854748A (zh) * 2012-09-27 2013-01-02 浙江荣泰科技企业有限公司 感光性组合物及其用途

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
EP0065326B1 (en) * 1981-05-15 1985-06-19 Agfa-Gevaert N.V. A photosensitive recording material and photographic processes wherein said material is used
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
EP0243934A3 (en) * 1986-05-01 1990-04-18 E.I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
US4818660A (en) * 1987-11-04 1989-04-04 E. I. Du Pont De Nemours And Company Photohardenable electrostatic master having improved backtransfer and charge decay
JPH02101065A (ja) * 1988-10-06 1990-04-12 Tanabe Seiyaku Co Ltd イミダゾリン誘導体及びその製法
US5922751A (en) * 1994-06-24 1999-07-13 Euro-Celtique, S.A. Aryl pyrazole compound for inhibiting phosphodiesterase IV and methods of using same
JP3400586B2 (ja) * 1995-02-10 2003-04-28 富士写真フイルム株式会社 光重合性組成物
JP3564836B2 (ja) * 1995-11-22 2004-09-15 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
DE69635297D1 (de) 1995-12-04 2006-03-02 Konishiroku Photo Ind Licht- und wärmeempfindliches Aufzeichnungsmaterial und Aufzeichnungsverfahren, das dieses Material verwendet
US6627309B2 (en) * 2001-05-08 2003-09-30 3M Innovative Properties Company Adhesive detackification
US7462443B2 (en) * 2003-09-05 2008-12-09 Hewlett-Packard Development Company, L.P. Leuco dye-containing coating compositions
EP1668417B1 (en) 2003-09-22 2009-05-13 Agfa Graphics N.V. Photopolymerizable composition.
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US20060093958A1 (en) * 2004-10-28 2006-05-04 Vladek Kasperchik Color forming compositions and associated methods
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
EP1788431B1 (en) 2005-11-18 2009-01-28 Agfa Graphics N.V. Method of making a lithographic printing plate
ATE475908T1 (de) 2005-11-18 2010-08-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788444B1 (en) 2005-11-18 2011-01-26 Agfa Graphics N.V. Method of making a lithographic printing plate
ATE426836T1 (de) 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788430B1 (en) 2005-11-18 2009-03-18 Agfa Graphics N.V. Method of making a lithographic printing plate
ATE426190T1 (de) 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ES2479066T3 (es) 2005-11-18 2014-07-23 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
ES2321205T3 (es) 2005-11-18 2009-06-03 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
EP1788449A1 (en) 2005-11-21 2007-05-23 Agfa Graphics N.V. Method for making a lithographic printing plate
ES2411697T3 (es) 2005-11-21 2013-07-08 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
ATE430330T1 (de) 2005-11-21 2009-05-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US8283100B2 (en) * 2006-05-16 2012-10-09 Hewlett-Packard Development Company, L.P. Color forming compositions and associated methods
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
CN101535900B (zh) * 2006-08-30 2013-09-04 斯蒂茨丁荷兰聚合物学会 一种制备聚合浮雕结构的方法
EP2153279B1 (en) 2007-05-25 2010-12-29 Agfa Graphics N.V. A lithographic printing plate precursor
ES2344668T3 (es) 2007-11-30 2010-09-02 Agfa Graphics N.V. Metodo para tratar una plancha de impresion litografica.
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
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EP2320274A4 (en) 2008-08-22 2011-12-14 Fujifilm Corp METHOD FOR MANUFACTURING A LITHOGRAPHIC PRINTING PLATE
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EP2338088B1 (en) 2008-10-15 2012-09-19 International Paper Company Composition, process of preparation and method of application and exposure for light imaging paper
PT2340463E (pt) 2008-10-15 2015-02-24 Int Paper Co Composição de partículas de imagem e processo de imagem usando a luz de comprimento de onda dupla
JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
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JP2012073594A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
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JP5205483B2 (ja) 2011-02-04 2013-06-05 富士フイルム株式会社 平版印刷版原版及び製版方法
JP5211187B2 (ja) 2011-02-28 2013-06-12 富士フイルム株式会社 平版印刷版原版及び製版方法
EP3001249B1 (en) 2011-02-28 2019-12-25 FUJIFILM Corporation Lithographic printing plate precursors and processes for preparing lithographic printing plates
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JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
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US11141919B2 (en) 2015-12-09 2021-10-12 Holo, Inc. Multi-material stereolithographic three dimensional printing
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US10935891B2 (en) 2017-03-13 2021-03-02 Holo, Inc. Multi wavelength stereolithography hardware configurations
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US10245785B2 (en) * 2017-06-16 2019-04-02 Holo, Inc. Methods for stereolithography three-dimensional printing
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Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL296772A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1962-03-21
US3445234A (en) * 1962-10-31 1969-05-20 Du Pont Leuco dye/hexaarylbiimidazole imageforming composition
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3390994A (en) * 1966-02-17 1968-07-02 Du Pont Photodeactivatable light-sensitive color-forming composition
US3615481A (en) * 1969-05-19 1971-10-26 Du Pont Leuco dye/hexaarylbiimidazole thermally activated imaging process
US3661461A (en) * 1969-11-26 1972-05-09 Du Pont Co-irradiation system for producing positive images
FR2089284A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1970-04-09 1972-01-07 Agfa Gevaert Nv
US3658543A (en) * 1970-12-18 1972-04-25 Du Pont Dual response photosensitive composition containing acyl ester of triethanolamine

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59140447A (ja) * 1983-02-01 1984-08-11 Hodogaya Chem Co Ltd 感光性組成物
JPS59227264A (ja) * 1983-05-26 1984-12-20 ソシエテ・デ・プロデユイ・ネツスル・ソシエテ・アノニム 野菜パスタの製造方法
JPS6355539A (ja) * 1986-05-30 1988-03-10 Toyobo Co Ltd 画像形成材料および画像形成方法
US7645561B1 (en) 1997-09-19 2010-01-12 Hitachi Chemical Company, Ltd. Photosensitive film
US7687224B2 (en) 1997-09-19 2010-03-30 Hitachi Chemical Company, Ltd. Photosensitive film
JP2007011046A (ja) * 2005-06-30 2007-01-18 Fujifilm Holdings Corp 感光性組成物および画像記録材料並びに画像記録方法
CN102854748A (zh) * 2012-09-27 2013-01-02 浙江荣泰科技企业有限公司 感光性组合物及其用途

Also Published As

Publication number Publication date
US4252887A (en) 1981-02-24
DE3066051D1 (en) 1984-02-09
EP0024629B1 (en) 1984-01-04
EP0024629A2 (en) 1981-03-11
EP0024629A3 (en) 1982-02-03
CA1137348A (en) 1982-12-14
JPS632099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-01-16

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