JPS5633831A - Pattern inspection device - Google Patents

Pattern inspection device

Info

Publication number
JPS5633831A
JPS5633831A JP10989979A JP10989979A JPS5633831A JP S5633831 A JPS5633831 A JP S5633831A JP 10989979 A JP10989979 A JP 10989979A JP 10989979 A JP10989979 A JP 10989979A JP S5633831 A JPS5633831 A JP S5633831A
Authority
JP
Japan
Prior art keywords
inspection
region
regions
stage
splitted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10989979A
Other languages
Japanese (ja)
Inventor
Tadao Nakakuki
Taku Yoshida
Masayuki Oyama
Kikuo Mita
Masahito Nakajima
Katsumi Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10989979A priority Critical patent/JPS5633831A/en
Publication of JPS5633831A publication Critical patent/JPS5633831A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To minimize the movement of a stage or a light source for light scanning required for inspection and to perform accurate inspection by splitting the inspection region of a tested substance into several specific regions wherein pattern inspection is done for the splitted regions. CONSTITUTION:A photo mark P is installed on the stage of a pattern inspection device. At that time, one region A out of the regions of the photo mask splitted into n>=2, for example, four-splitted regions is placed under a window W' for light beam inspection. A light spot scans on the region A as shown in an arrow dashed line and defective positions are recorded by an X-Y plotter. After completing the inspection of the region A, the photo mask P is then installed on the stage so that a region B may locate under the window W' for light beam inspection and defective positions are converted into a co-ordinate and plotted to perform inspection. The inspection of C and D regions is done in a same mannger. In this way, a small range of the movement of the stage or light source required for the inspection is permitted and measuring errors will be minimized.
JP10989979A 1979-08-29 1979-08-29 Pattern inspection device Pending JPS5633831A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10989979A JPS5633831A (en) 1979-08-29 1979-08-29 Pattern inspection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10989979A JPS5633831A (en) 1979-08-29 1979-08-29 Pattern inspection device

Publications (1)

Publication Number Publication Date
JPS5633831A true JPS5633831A (en) 1981-04-04

Family

ID=14521975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10989979A Pending JPS5633831A (en) 1979-08-29 1979-08-29 Pattern inspection device

Country Status (1)

Country Link
JP (1) JPS5633831A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105372249A (en) * 2015-11-26 2016-03-02 铜陵晶能电子股份有限公司 Bright spot inspection device for lithium battery diaphragm

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105372249A (en) * 2015-11-26 2016-03-02 铜陵晶能电子股份有限公司 Bright spot inspection device for lithium battery diaphragm

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