JPS5632748A - Ic with bump and manufacture thereof - Google Patents
Ic with bump and manufacture thereofInfo
- Publication number
- JPS5632748A JPS5632748A JP10797579A JP10797579A JPS5632748A JP S5632748 A JPS5632748 A JP S5632748A JP 10797579 A JP10797579 A JP 10797579A JP 10797579 A JP10797579 A JP 10797579A JP S5632748 A JPS5632748 A JP S5632748A
- Authority
- JP
- Japan
- Prior art keywords
- bump
- substrate
- tin
- plated
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemically Coating (AREA)
Abstract
PURPOSE:To simplify the steps of treating a substrate on which an IC with a bump is carried by employing a bump coated with a tin coating by an electroless plating process on the copper bump as a bump when bonding the IC on the substrate, thereby eliminating shortcircuit or the like thereat. CONSTITUTION:An aluminum wiring layer 1 is formed on the substrate, and is surrounded by an insulating protective film 2, and a barrier metallic film 3 of Cr of the like is coated from the surface of the layer 1 over the end of the film 2. Then, a plating metallic film 4 is laminated thereon, the thick copper bump 5 is precipitated thereon by plating, and the exposed surface of the bump 5 is electrolessly plated while coating other portion with positive type photoresist to thus form the tin coating 6 thereon. In this manner, there can be used a substrate plated by Au as the substrate, the wire may not be shortcircuited due to tin whisker when using a tin- plated substrate, the treatment thereafter may also be eliminated, and the reliability of the IC may be consequently improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10797579A JPS5632748A (en) | 1979-08-24 | 1979-08-24 | Ic with bump and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10797579A JPS5632748A (en) | 1979-08-24 | 1979-08-24 | Ic with bump and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5632748A true JPS5632748A (en) | 1981-04-02 |
Family
ID=14472798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10797579A Pending JPS5632748A (en) | 1979-08-24 | 1979-08-24 | Ic with bump and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5632748A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6116486A (en) * | 1984-06-29 | 1986-01-24 | 住友電気工業株式会社 | Method of forming crosslinked polyethylene insulated power cable connector |
JP2009124130A (en) * | 2007-11-16 | 2009-06-04 | Hwabeak Engineering Co Ltd | Copper pole-tin bump formed in semiconductor chip, and its forming method |
-
1979
- 1979-08-24 JP JP10797579A patent/JPS5632748A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6116486A (en) * | 1984-06-29 | 1986-01-24 | 住友電気工業株式会社 | Method of forming crosslinked polyethylene insulated power cable connector |
JPH0247827B2 (en) * | 1984-06-29 | 1990-10-23 | Sumitomo Electric Industries | |
JP2009124130A (en) * | 2007-11-16 | 2009-06-04 | Hwabeak Engineering Co Ltd | Copper pole-tin bump formed in semiconductor chip, and its forming method |
US7781325B2 (en) * | 2007-11-16 | 2010-08-24 | Hwaback Engineering Co., Ltd. | Copper pillar tin bump on semiconductor chip and method of forming the same |
TWI450336B (en) * | 2007-11-16 | 2014-08-21 | Hwaback Enginnering Co Ltd | Copper pillar tin bump on semiconductor chip and method of forming of the same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS62145758A (en) | Method for protecting copper bonding pad from oxidation using palladium | |
JP3076342B1 (en) | Film carrier tape for mounting electronic components and method of manufacturing the same | |
JP3061613B2 (en) | Film carrier tape for mounting electronic components and method of manufacturing the same | |
JPS5632748A (en) | Ic with bump and manufacture thereof | |
JPS5773952A (en) | Chip for face down bonding and production thereof | |
JPS6056073A (en) | Method for coating ceramic substrate with partially thick gold film | |
JPS55138864A (en) | Method of fabricating semiconductor assembling substrate | |
JPS5660038A (en) | Semiconductor device | |
JPS5730353A (en) | Semiconductor device | |
JP2555917B2 (en) | Film carrier for semiconductor device | |
JPS5322365A (en) | Resin mold type semiconductor device and its production | |
JPS6417450A (en) | Formation of bump | |
JPS63168043A (en) | Lead frame | |
JPS6472590A (en) | Method of mounting component of aluminum conductor circuit substrate | |
JPS6138187Y2 (en) | ||
JPS56161663A (en) | Thin film integrated circuit | |
JPH03200343A (en) | Method of forming solder bump | |
JPH06260741A (en) | Manufacture of metal base circuit board | |
JPS56142886A (en) | Tin plating method for aluminum alloy | |
JPS5680151A (en) | Production of semiconductor device having plated projecting electrode | |
SU472571A1 (en) | Method of depositing metal on combination metal-dielectric surfaces | |
JPH0760843B2 (en) | Film carrier tape | |
JPH05247683A (en) | Method for suppressing tin plating whisker | |
JPS57169253A (en) | Circuit substrate | |
JPS5759343A (en) | Surface treating method for circuit substrate |