JPS5627143A - Polymer type photoresist developing method - Google Patents

Polymer type photoresist developing method

Info

Publication number
JPS5627143A
JPS5627143A JP10334579A JP10334579A JPS5627143A JP S5627143 A JPS5627143 A JP S5627143A JP 10334579 A JP10334579 A JP 10334579A JP 10334579 A JP10334579 A JP 10334579A JP S5627143 A JPS5627143 A JP S5627143A
Authority
JP
Japan
Prior art keywords
cyclized
image
polymer type
type photoresist
polybutadiene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10334579A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0145054B2 (enrdf_load_stackoverflow
Inventor
Kazuo Sano
Yoshiyuki Harita
Toko Harada
Kazuhiko Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP10334579A priority Critical patent/JPS5627143A/ja
Publication of JPS5627143A publication Critical patent/JPS5627143A/ja
Publication of JPH0145054B2 publication Critical patent/JPH0145054B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10334579A 1979-08-14 1979-08-14 Polymer type photoresist developing method Granted JPS5627143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10334579A JPS5627143A (en) 1979-08-14 1979-08-14 Polymer type photoresist developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10334579A JPS5627143A (en) 1979-08-14 1979-08-14 Polymer type photoresist developing method

Publications (2)

Publication Number Publication Date
JPS5627143A true JPS5627143A (en) 1981-03-16
JPH0145054B2 JPH0145054B2 (enrdf_load_stackoverflow) 1989-10-02

Family

ID=14351542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10334579A Granted JPS5627143A (en) 1979-08-14 1979-08-14 Polymer type photoresist developing method

Country Status (1)

Country Link
JP (1) JPS5627143A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS62117466A (ja) * 1985-11-18 1987-05-28 Canon Inc 記憶装置
JPH073627U (ja) * 1992-07-07 1995-01-20 幸雄 中濱 医療ベッド用電動昇降機

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4923896A (enrdf_load_stackoverflow) * 1972-06-29 1974-03-02
JPS5151939A (ja) * 1974-10-31 1976-05-07 Canon Kk Saisenpataanyohotorejisutogenzoeki
JPS5276924A (en) * 1975-12-23 1977-06-28 Japan Synthetic Rubber Co Ltd Developer
JPS5463828A (en) * 1977-10-31 1979-05-23 Japan Synthetic Rubber Co Ltd Developer for photoresist

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4923896A (enrdf_load_stackoverflow) * 1972-06-29 1974-03-02
JPS5151939A (ja) * 1974-10-31 1976-05-07 Canon Kk Saisenpataanyohotorejisutogenzoeki
JPS5276924A (en) * 1975-12-23 1977-06-28 Japan Synthetic Rubber Co Ltd Developer
JPS5463828A (en) * 1977-10-31 1979-05-23 Japan Synthetic Rubber Co Ltd Developer for photoresist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS62117466A (ja) * 1985-11-18 1987-05-28 Canon Inc 記憶装置
JPH073627U (ja) * 1992-07-07 1995-01-20 幸雄 中濱 医療ベッド用電動昇降機

Also Published As

Publication number Publication date
JPH0145054B2 (enrdf_load_stackoverflow) 1989-10-02

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