JPS562634A - Parallel flat plate type plasma etching device - Google Patents
Parallel flat plate type plasma etching deviceInfo
- Publication number
- JPS562634A JPS562634A JP7946679A JP7946679A JPS562634A JP S562634 A JPS562634 A JP S562634A JP 7946679 A JP7946679 A JP 7946679A JP 7946679 A JP7946679 A JP 7946679A JP S562634 A JPS562634 A JP S562634A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- electrode
- flat plate
- parallel flat
- charged particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7946679A JPS562634A (en) | 1979-06-20 | 1979-06-20 | Parallel flat plate type plasma etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7946679A JPS562634A (en) | 1979-06-20 | 1979-06-20 | Parallel flat plate type plasma etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS562634A true JPS562634A (en) | 1981-01-12 |
Family
ID=13690654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7946679A Pending JPS562634A (en) | 1979-06-20 | 1979-06-20 | Parallel flat plate type plasma etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS562634A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5629330A (en) * | 1979-08-18 | 1981-03-24 | Nippon Telegr & Teleph Corp <Ntt> | Surface treatment of silicon wafer |
JPS57132440U (ja) * | 1981-02-13 | 1982-08-18 | ||
JP2014130907A (ja) * | 2012-12-28 | 2014-07-10 | Shibaura Mechatronics Corp | プラズマ処理装置およびプラズマ処理方法 |
-
1979
- 1979-06-20 JP JP7946679A patent/JPS562634A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5629330A (en) * | 1979-08-18 | 1981-03-24 | Nippon Telegr & Teleph Corp <Ntt> | Surface treatment of silicon wafer |
JPS5841767B2 (ja) * | 1979-08-18 | 1983-09-14 | 日本電信電話株式会社 | シリコンウェハの表面処理方法 |
JPS57132440U (ja) * | 1981-02-13 | 1982-08-18 | ||
JP2014130907A (ja) * | 2012-12-28 | 2014-07-10 | Shibaura Mechatronics Corp | プラズマ処理装置およびプラズマ処理方法 |
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