JPS5618079B2 - - Google Patents
Info
- Publication number
- JPS5618079B2 JPS5618079B2 JP9874675A JP9874675A JPS5618079B2 JP S5618079 B2 JPS5618079 B2 JP S5618079B2 JP 9874675 A JP9874675 A JP 9874675A JP 9874675 A JP9874675 A JP 9874675A JP S5618079 B2 JPS5618079 B2 JP S5618079B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9874675A JPS5224131A (en) | 1975-08-14 | 1975-08-14 | Luster* thick rhodium plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9874675A JPS5224131A (en) | 1975-08-14 | 1975-08-14 | Luster* thick rhodium plating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5224131A JPS5224131A (en) | 1977-02-23 |
| JPS5618079B2 true JPS5618079B2 (fi) | 1981-04-25 |
Family
ID=14228026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9874675A Granted JPS5224131A (en) | 1975-08-14 | 1975-08-14 | Luster* thick rhodium plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5224131A (fi) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4416742A (en) * | 1980-09-25 | 1983-11-22 | Nippon Mining Co., Ltd. | Process and electrolytic bath for making a rhodium-plated article having a black or blue color |
| JPS604920B2 (ja) * | 1981-03-30 | 1985-02-07 | 日本鉱業株式会社 | 耐摩耗性良好な黒色ロジウムメッキ被覆物品の製造方法 |
| DE3100997C2 (de) * | 1981-01-15 | 1986-08-14 | Degussa Ag, 6000 Frankfurt | Bad zum galvanischen Abscheiden von Rhodiumüberzügen |
| JPH01290788A (ja) * | 1988-05-16 | 1989-11-22 | Nippon Mining Co Ltd | 低応カロジウムめっき液及びその製造方法 |
| EP1244827B1 (de) * | 1999-12-23 | 2006-04-19 | Umicore Galvanotechnik GmbH | Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür |
| US8372744B2 (en) * | 2007-04-20 | 2013-02-12 | International Business Machines Corporation | Fabricating a contact rhodium structure by electroplating and electroplating composition |
| CN110494596B (zh) * | 2018-03-15 | 2023-06-23 | Ｅｅｊａ株式会社 | 电解铑电镀液 |
-
1975
- 1975-08-14 JP JP9874675A patent/JPS5224131A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| MODERN ELECTROPLATING=1967 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5224131A (en) | 1977-02-23 |