JPS561717B2 - - Google Patents

Info

Publication number
JPS561717B2
JPS561717B2 JP2623673A JP2623673A JPS561717B2 JP S561717 B2 JPS561717 B2 JP S561717B2 JP 2623673 A JP2623673 A JP 2623673A JP 2623673 A JP2623673 A JP 2623673A JP S561717 B2 JPS561717 B2 JP S561717B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2623673A
Other versions
JPS4918433A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4918433A publication Critical patent/JPS4918433A/ja
Publication of JPS561717B2 publication Critical patent/JPS561717B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/39—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using thyristors or the avalanche or negative resistance type, e.g. PNPN, SCR, SCS, UJT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0744—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common without components of the field effect type
    • H01L27/075—Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. lateral bipolar transistor, and vertical bipolar transistor and resistor
    • H01L27/0755—Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Static Random-Access Memory (AREA)
JP2623673A 1972-04-18 1973-03-07 Expired JPS561717B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24522172A 1972-04-18 1972-04-18

Publications (2)

Publication Number Publication Date
JPS4918433A JPS4918433A (ja) 1974-02-18
JPS561717B2 true JPS561717B2 (ja) 1981-01-14

Family

ID=22925789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2623673A Expired JPS561717B2 (ja) 1972-04-18 1973-03-07

Country Status (5)

Country Link
US (1) US3761896A (ja)
JP (1) JPS561717B2 (ja)
DE (1) DE2303409C2 (ja)
FR (1) FR2180688B1 (ja)
GB (1) GB1419834A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283118A (ja) * 1992-03-28 1993-10-29 Nippon Seiki Co Ltd 電気接続装置

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3846768A (en) * 1972-12-29 1974-11-05 Ibm Fixed threshold variable threshold storage device for use in a semiconductor storage array
GB1469814A (en) * 1973-04-26 1977-04-06 Energy Conversion Devices Inc Solid state electronic device and circuit therefor
US4142112A (en) * 1977-05-06 1979-02-27 Sperry Rand Corporation Single active element controlled-inversion semiconductor storage cell devices and storage matrices employing same
US4180866A (en) * 1977-08-01 1979-12-25 Burroughs Corporation Single transistor memory cell employing an amorphous semiconductor threshold device
US4235501A (en) * 1979-03-20 1980-11-25 Bell Telephone Laboratories, Incorporated Connector
US4431305A (en) * 1981-07-30 1984-02-14 International Business Machines Corporation High density DC stable memory cell
EP0072221B1 (en) * 1981-08-07 1987-11-11 The British Petroleum Company p.l.c. Non-volatile electrically programmable memory device
US5334880A (en) * 1991-04-30 1994-08-02 International Business Machines Corporation Low voltage programmable storage element
US5312684A (en) * 1991-05-02 1994-05-17 Dow Corning Corporation Threshold switching device
US5883827A (en) * 1996-08-26 1999-03-16 Micron Technology, Inc. Method and apparatus for reading/writing data in a memory system including programmable resistors
US7385219B2 (en) 2000-02-11 2008-06-10 A{umlaut over (x)}on Technologies Corporation Optimized solid electrolyte for programmable metallization cell devices and structures
US8134140B2 (en) * 2000-02-11 2012-03-13 Axon Technologies Corporation Programmable metallization cell structure including an integrated diode, device including the structure, and method of forming same
US8218350B2 (en) 2000-02-11 2012-07-10 Axon Technologies Corporation Programmable metallization cell structure including an integrated diode, device including the structure, and method of forming same
US7675766B2 (en) * 2000-02-11 2010-03-09 Axon Technologies Corporation Microelectric programmable device and methods of forming and programming the same
US6456525B1 (en) 2000-09-15 2002-09-24 Hewlett-Packard Company Short-tolerant resistive cross point array
US6633497B2 (en) * 2001-06-22 2003-10-14 Hewlett-Packard Development Company, L.P. Resistive cross point array of short-tolerant memory cells
FR2836751A1 (fr) * 2002-02-11 2003-09-05 St Microelectronics Sa Cellule memoire a programmation unique non destructrice
KR100773537B1 (ko) * 2003-06-03 2007-11-07 삼성전자주식회사 한 개의 스위칭 소자와 한 개의 저항체를 포함하는비휘발성 메모리 장치 및 그 제조 방법
KR101051704B1 (ko) * 2004-04-28 2011-07-25 삼성전자주식회사 저항 구배를 지닌 다층막을 이용한 메모리 소자
JP4189395B2 (ja) * 2004-07-28 2008-12-03 シャープ株式会社 不揮発性半導体記憶装置及び読み出し方法
KR100682926B1 (ko) * 2005-01-31 2007-02-15 삼성전자주식회사 저항체를 이용한 비휘발성 메모리 소자 및 그 제조방법
US7362604B2 (en) * 2005-07-11 2008-04-22 Sandisk 3D Llc Apparatus and method for programming an array of nonvolatile memory cells including switchable resistor memory elements
US7345907B2 (en) * 2005-07-11 2008-03-18 Sandisk 3D Llc Apparatus and method for reading an array of nonvolatile memory cells including switchable resistor memory elements
US7542337B2 (en) * 2006-07-31 2009-06-02 Sandisk 3D Llc Apparatus for reading a multi-level passive element memory cell array
US7542338B2 (en) * 2006-07-31 2009-06-02 Sandisk 3D Llc Method for reading a multi-level passive element memory cell array
US8279704B2 (en) * 2006-07-31 2012-10-02 Sandisk 3D Llc Decoder circuitry providing forward and reverse modes of memory array operation and method for biasing same
US20100092656A1 (en) * 2008-10-10 2010-04-15 Axon Technologies Corporation Printable ionic structure and method of formation
US8233309B2 (en) * 2009-10-26 2012-07-31 Sandisk 3D Llc Non-volatile memory array architecture incorporating 1T-1R near 4F2 memory cell
CN102136835B (zh) * 2010-01-22 2013-06-05 清华大学 温控开关、其应用方法及使用该温控开关的报警系统
CN102136836B (zh) * 2010-01-22 2013-02-13 清华大学 压控开关、其应用方法及使用该压控开关的报警系统
US11444124B2 (en) 2017-07-26 2022-09-13 The Hong Kong University Of Science And Technology Hybrid memristor/field-effect transistor memory cell and its information encoding scheme

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3206730A (en) * 1961-06-13 1965-09-14 Nippon Electric Co Tunnel diode memory device
DE1252819B (de) * 1961-11-06 1967-10-26 Western Electric Company Incorporated, New York, N. Y. (V. St. A.) Elektronisches Festkörperbauelement
US3201764A (en) * 1961-11-30 1965-08-17 Carlyle V Parker Light controlled electronic matrix switch
US3363240A (en) * 1964-06-22 1968-01-09 Burroughs Corp Solid state electron emissive memory and display apparatus and method
US3324531A (en) * 1965-03-29 1967-06-13 Gen Electric Solid state electronic devices, method and apparatus
US3467945A (en) * 1966-03-08 1969-09-16 Itt Electrically controlled matrix
US3488636A (en) * 1966-08-22 1970-01-06 Fairchild Camera Instr Co Optically programmable read only memory

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283118A (ja) * 1992-03-28 1993-10-29 Nippon Seiki Co Ltd 電気接続装置

Also Published As

Publication number Publication date
GB1419834A (en) 1975-12-31
US3761896A (en) 1973-09-25
FR2180688A1 (ja) 1973-11-30
DE2303409C2 (de) 1982-12-02
DE2303409A1 (de) 1973-10-31
JPS4918433A (ja) 1974-02-18
FR2180688B1 (ja) 1976-05-21

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