JPS56168820A - Deodorization device for waste gas of urethane curing oven - Google Patents

Deodorization device for waste gas of urethane curing oven

Info

Publication number
JPS56168820A
JPS56168820A JP7196480A JP7196480A JPS56168820A JP S56168820 A JPS56168820 A JP S56168820A JP 7196480 A JP7196480 A JP 7196480A JP 7196480 A JP7196480 A JP 7196480A JP S56168820 A JPS56168820 A JP S56168820A
Authority
JP
Japan
Prior art keywords
tower
gas
chemical fluids
duct
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7196480A
Other languages
Japanese (ja)
Inventor
Azuma Arai
Takashige Matsuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP7196480A priority Critical patent/JPS56168820A/en
Publication of JPS56168820A publication Critical patent/JPS56168820A/en
Pending legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Polyurethanes Or Polyureas (AREA)

Abstract

PURPOSE: To suppress a rise of running cost due to chemical fluids and to prevent occurrence of the secondary environmental pollution to drainage systems by making multistage treating in the order of a cooling tower, an absorption tower of chemical fluids and an adsorption tower of activated carbon in the titled device using the liquid-liquid absorption method.
CONSTITUTION: Offensive odor gas 1 is sucked by a fan 13 and brought into contact countercurrently with NaOH solution spouted from a nozzle 26 in a packed layer 22 in a cooling tower 10 where it is cooled and absorbs HCl and HF. The NaOH solution is supplied into the tower from a storage tank 15 by a pump 34 while maintaining its concentration with a pH meter. The gas that passed through a mist separator 24 and a duct 41 is supplied from a storage tank 4 by a pump 33 in the packed layer 21 of an absorption tower 11 of chemical fluids and brought into contact countercurrently with chlorine dioxide solution spouted from a nozzle 25 to absorb and oxidize the odorous component. The gas that passed through a mist separator 23 and a duct 42 is further introduced into an adsorption tower 12 of activated carbon where unabsorbed odorous component is adsorbed and removed. The perfectly deodorized gas is discharged to the open air.
COPYRIGHT: (C)1981,JPO&Japio
JP7196480A 1980-05-29 1980-05-29 Deodorization device for waste gas of urethane curing oven Pending JPS56168820A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7196480A JPS56168820A (en) 1980-05-29 1980-05-29 Deodorization device for waste gas of urethane curing oven

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7196480A JPS56168820A (en) 1980-05-29 1980-05-29 Deodorization device for waste gas of urethane curing oven

Publications (1)

Publication Number Publication Date
JPS56168820A true JPS56168820A (en) 1981-12-25

Family

ID=13475659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7196480A Pending JPS56168820A (en) 1980-05-29 1980-05-29 Deodorization device for waste gas of urethane curing oven

Country Status (1)

Country Link
JP (1) JPS56168820A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100713615B1 (en) 2006-04-05 2007-05-02 유림엔마텍(주) Offensive odor treatment apparatus using chlorine dioxide
CN106076067A (en) * 2016-08-03 2016-11-09 安徽八化工股份有限公司 A kind of for processing the device of tail gas in benzene chloride production
CN106076075A (en) * 2016-08-03 2016-11-09 安徽八化工股份有限公司 Tail gas recycle cleaning equipment in a kind of benzene chloride production
CN106110835A (en) * 2016-08-03 2016-11-16 安徽八化工股份有限公司 The processing method of benzene in the two-stage nitration tail gas of a kind of benzene chloride production
CN106215624A (en) * 2016-08-03 2016-12-14 安徽八化工股份有限公司 The processing method of HCl in the two-stage nitration tail gas of a kind of benzene chloride production
CN106215623A (en) * 2016-08-03 2016-12-14 安徽八化工股份有限公司 A kind of processing method of the two-stage nitration tail gas of benzene chloride production
CN106237795A (en) * 2016-08-31 2016-12-21 安徽八化工股份有限公司 Two-stage nitration exhaust gas processing device in a kind of benzene chloride production

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100713615B1 (en) 2006-04-05 2007-05-02 유림엔마텍(주) Offensive odor treatment apparatus using chlorine dioxide
CN106076067A (en) * 2016-08-03 2016-11-09 安徽八化工股份有限公司 A kind of for processing the device of tail gas in benzene chloride production
CN106076075A (en) * 2016-08-03 2016-11-09 安徽八化工股份有限公司 Tail gas recycle cleaning equipment in a kind of benzene chloride production
CN106110835A (en) * 2016-08-03 2016-11-16 安徽八化工股份有限公司 The processing method of benzene in the two-stage nitration tail gas of a kind of benzene chloride production
CN106215624A (en) * 2016-08-03 2016-12-14 安徽八化工股份有限公司 The processing method of HCl in the two-stage nitration tail gas of a kind of benzene chloride production
CN106215623A (en) * 2016-08-03 2016-12-14 安徽八化工股份有限公司 A kind of processing method of the two-stage nitration tail gas of benzene chloride production
CN106215623B (en) * 2016-08-03 2019-02-01 安徽八一化工股份有限公司 A kind of processing method of two sections of tail gas of benzene chloride production
CN106237795A (en) * 2016-08-31 2016-12-21 安徽八化工股份有限公司 Two-stage nitration exhaust gas processing device in a kind of benzene chloride production

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