JPS5616667A - Cobalt thin film - Google Patents

Cobalt thin film

Info

Publication number
JPS5616667A
JPS5616667A JP9131979A JP9131979A JPS5616667A JP S5616667 A JPS5616667 A JP S5616667A JP 9131979 A JP9131979 A JP 9131979A JP 9131979 A JP9131979 A JP 9131979A JP S5616667 A JPS5616667 A JP S5616667A
Authority
JP
Japan
Prior art keywords
film
vapor
deposited
electron beam
corrosion resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9131979A
Other languages
Japanese (ja)
Other versions
JPS6141985B2 (en
Inventor
Akihiro Imai
Toshiaki Kunieda
Yasuo Iijima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9131979A priority Critical patent/JPS5616667A/en
Publication of JPS5616667A publication Critical patent/JPS5616667A/en
Publication of JPS6141985B2 publication Critical patent/JPS6141985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To form a Co thin film having superior corrosion resistance on the surface of a substrate film by specifying the incidence angle of Co vapor for diagonal vapor deposition and introducing oxygen gas when Co is vapor deposited on the film surface by an electron beam method. CONSTITUTION:Polyester substrate film 1 is pulled out of uncoiling roll 2, the temp. of can 3 is raised to 80 deg.C, and incidence angle theta of Co vapor for diagonal vapor deposition from Co evaporation source 5 is regulated to >=10 deg.. While introducing oxygen gas at 0.3l/min rate, Co is vapor deposited on film 1 by an electron beam method, and film 1 is coiled around coiling reel 4. The resulting Co deposited film has been oxidized fairly to the interior. When this film is dipped in an aqueous soln. of 30 deg.C contg. 0.02M/l borax and 0.1M/l boric acid to carry out a rust prevention test, the 3min value of natural electrode potential shows potential more positive than-4.0V to a satd. calomel electrode, and this film is superior to a simple Co deposited film in corrosion resistance under an atmosphere of 60 deg.C and 90% relative humidity.
JP9131979A 1979-07-18 1979-07-18 Cobalt thin film Granted JPS5616667A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9131979A JPS5616667A (en) 1979-07-18 1979-07-18 Cobalt thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9131979A JPS5616667A (en) 1979-07-18 1979-07-18 Cobalt thin film

Publications (2)

Publication Number Publication Date
JPS5616667A true JPS5616667A (en) 1981-02-17
JPS6141985B2 JPS6141985B2 (en) 1986-09-18

Family

ID=14023133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9131979A Granted JPS5616667A (en) 1979-07-18 1979-07-18 Cobalt thin film

Country Status (1)

Country Link
JP (1) JPS5616667A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5419199A (en) * 1977-07-12 1979-02-13 Matsushita Electric Ind Co Ltd Magnetic recording medium porcess

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5419199A (en) * 1977-07-12 1979-02-13 Matsushita Electric Ind Co Ltd Magnetic recording medium porcess

Also Published As

Publication number Publication date
JPS6141985B2 (en) 1986-09-18

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