JPS56153739A - Exposing method for electron beam - Google Patents

Exposing method for electron beam

Info

Publication number
JPS56153739A
JPS56153739A JP5236281A JP5236281A JPS56153739A JP S56153739 A JPS56153739 A JP S56153739A JP 5236281 A JP5236281 A JP 5236281A JP 5236281 A JP5236281 A JP 5236281A JP S56153739 A JPS56153739 A JP S56153739A
Authority
JP
Japan
Prior art keywords
electron beam
region
patterning
exposure
astigmation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5236281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6227534B2 (OSRAM
Inventor
Yasuo Furukawa
Masahiro Okabe
Noriaki Nakayama
Seigo Igaki
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5236281A priority Critical patent/JPS56153739A/ja
Publication of JPS56153739A publication Critical patent/JPS56153739A/ja
Publication of JPS6227534B2 publication Critical patent/JPS6227534B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP5236281A 1981-04-09 1981-04-09 Exposing method for electron beam Granted JPS56153739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5236281A JPS56153739A (en) 1981-04-09 1981-04-09 Exposing method for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5236281A JPS56153739A (en) 1981-04-09 1981-04-09 Exposing method for electron beam

Publications (2)

Publication Number Publication Date
JPS56153739A true JPS56153739A (en) 1981-11-27
JPS6227534B2 JPS6227534B2 (OSRAM) 1987-06-15

Family

ID=12912690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5236281A Granted JPS56153739A (en) 1981-04-09 1981-04-09 Exposing method for electron beam

Country Status (1)

Country Link
JP (1) JPS56153739A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269531A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (OSRAM) * 1974-04-18 1975-11-22
JPS51118968A (en) * 1975-04-11 1976-10-19 Toshiba Corp Electron beam exposure device
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (OSRAM) * 1974-04-18 1975-11-22
JPS51118968A (en) * 1975-04-11 1976-10-19 Toshiba Corp Electron beam exposure device
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269531A (ja) * 1987-04-28 1988-11-07 Canon Inc 荷電ビ−ム装置

Also Published As

Publication number Publication date
JPS6227534B2 (OSRAM) 1987-06-15

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