JPS56145645A - Ion injection device - Google Patents

Ion injection device

Info

Publication number
JPS56145645A
JPS56145645A JP4870980A JP4870980A JPS56145645A JP S56145645 A JPS56145645 A JP S56145645A JP 4870980 A JP4870980 A JP 4870980A JP 4870980 A JP4870980 A JP 4870980A JP S56145645 A JPS56145645 A JP S56145645A
Authority
JP
Japan
Prior art keywords
ion beam
main
ion
faraday cup
detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4870980A
Other languages
Japanese (ja)
Inventor
Makoto Sato
Junichiro Maruyama
Keizo Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4870980A priority Critical patent/JPS56145645A/en
Publication of JPS56145645A publication Critical patent/JPS56145645A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

Abstract

PURPOSE:To easily detect abnormal scanning operation of an ion beam, by providing detecting Faraday cups ar an incident side of the ion beam in a main Faraday cup. CONSTITUTION:In front of a defining mask 11a (in the incident side of an ion beam with respect to a main Faraday cup) in an ion injection part, detecting Faraday cups 21, 31 are provided on a plane including the axial line of a main Faraday cup 11c at a symmetrical position for said axial line. During irradiation of an ion beam, ion currents flow in the main Faraday cup 11c and the detecting Faraday cups 21, 31. A change of ratio in said currents is detected to suspend the irradiation of the ion beam when abnormality occurs.
JP4870980A 1980-04-15 1980-04-15 Ion injection device Pending JPS56145645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4870980A JPS56145645A (en) 1980-04-15 1980-04-15 Ion injection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4870980A JPS56145645A (en) 1980-04-15 1980-04-15 Ion injection device

Publications (1)

Publication Number Publication Date
JPS56145645A true JPS56145645A (en) 1981-11-12

Family

ID=12810835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4870980A Pending JPS56145645A (en) 1980-04-15 1980-04-15 Ion injection device

Country Status (1)

Country Link
JP (1) JPS56145645A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276229A1 (en) * 1986-05-16 1988-08-03 Varian Associates Dose measurement and uniformity monitoring system for ion implantation.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276229A1 (en) * 1986-05-16 1988-08-03 Varian Associates Dose measurement and uniformity monitoring system for ion implantation.

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