JPS56133830A - Inspection device for defect of regular pattern - Google Patents
Inspection device for defect of regular patternInfo
- Publication number
- JPS56133830A JPS56133830A JP3684380A JP3684380A JPS56133830A JP S56133830 A JPS56133830 A JP S56133830A JP 3684380 A JP3684380 A JP 3684380A JP 3684380 A JP3684380 A JP 3684380A JP S56133830 A JPS56133830 A JP S56133830A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- defect
- type
- height
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 title abstract 6
- 238000007689 inspection Methods 0.000 title abstract 2
- 238000001914 filtration Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3684380A JPS56133830A (en) | 1980-03-25 | 1980-03-25 | Inspection device for defect of regular pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3684380A JPS56133830A (en) | 1980-03-25 | 1980-03-25 | Inspection device for defect of regular pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56133830A true JPS56133830A (en) | 1981-10-20 |
| JPS6326321B2 JPS6326321B2 (enrdf_load_stackoverflow) | 1988-05-30 |
Family
ID=12481034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3684380A Granted JPS56133830A (en) | 1980-03-25 | 1980-03-25 | Inspection device for defect of regular pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56133830A (enrdf_load_stackoverflow) |
-
1980
- 1980-03-25 JP JP3684380A patent/JPS56133830A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6326321B2 (enrdf_load_stackoverflow) | 1988-05-30 |
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