JPS56132737A - Cold electron discharge cathode - Google Patents
Cold electron discharge cathodeInfo
- Publication number
- JPS56132737A JPS56132737A JP3492380A JP3492380A JPS56132737A JP S56132737 A JPS56132737 A JP S56132737A JP 3492380 A JP3492380 A JP 3492380A JP 3492380 A JP3492380 A JP 3492380A JP S56132737 A JPS56132737 A JP S56132737A
- Authority
- JP
- Japan
- Prior art keywords
- type semiconductor
- semiconductor layer
- face
- semiconductor substrate
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/308—Semiconductor cathodes, e.g. cathodes with PN junction layers
Landscapes
- Cold Cathode And The Manufacture (AREA)
Abstract
PURPOSE:To achieve high electron emission efficiency, by increasing the ratio of electron flow injected from N type semiconductor substrate to P type semiconductor layer. CONSTITUTION:P type semiconductor layer 22 of low resistance is formed on one surface of high resistance N type semiconductor substrate 21 while an ohmic electrode 25 is formed on the back face. An ohmic electrode 24 is formed on the other side face of P type semiconductor layer 22 than its face jointing with N type semiconductor substrate 21 while a thin layer 23 of alkali metal is formed on another portion of the this face. Then forward bias voltage is applied between said ohmic electrodes 24, 25. The majority of the bias current is injected as the electron flow into P type semiconductor layer 22 to increase the electron to be discharged into the vacuum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3492380A JPS56132737A (en) | 1980-03-19 | 1980-03-19 | Cold electron discharge cathode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3492380A JPS56132737A (en) | 1980-03-19 | 1980-03-19 | Cold electron discharge cathode |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56132737A true JPS56132737A (en) | 1981-10-17 |
JPH0139616B2 JPH0139616B2 (en) | 1989-08-22 |
Family
ID=12427725
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3492380A Granted JPS56132737A (en) | 1980-03-19 | 1980-03-19 | Cold electron discharge cathode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56132737A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62272439A (en) * | 1986-05-20 | 1987-11-26 | Canon Inc | Electron emitting device |
JPH01146236A (en) * | 1987-12-03 | 1989-06-08 | Canon Inc | Electron beam generator |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430274A (en) * | 1977-08-10 | 1979-03-06 | Koyo Sangyo Co | Gypsum laminating board*and its making method |
JPS5446931A (en) * | 1977-09-17 | 1979-04-13 | Truetzschler & Co | Moving flat for comber |
-
1980
- 1980-03-19 JP JP3492380A patent/JPS56132737A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430274A (en) * | 1977-08-10 | 1979-03-06 | Koyo Sangyo Co | Gypsum laminating board*and its making method |
JPS5446931A (en) * | 1977-09-17 | 1979-04-13 | Truetzschler & Co | Moving flat for comber |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62272439A (en) * | 1986-05-20 | 1987-11-26 | Canon Inc | Electron emitting device |
JPH01146236A (en) * | 1987-12-03 | 1989-06-08 | Canon Inc | Electron beam generator |
Also Published As
Publication number | Publication date |
---|---|
JPH0139616B2 (en) | 1989-08-22 |
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