JPS56126926A - Projection type both surface exposure machine - Google Patents

Projection type both surface exposure machine

Info

Publication number
JPS56126926A
JPS56126926A JP3110880A JP3110880A JPS56126926A JP S56126926 A JPS56126926 A JP S56126926A JP 3110880 A JP3110880 A JP 3110880A JP 3110880 A JP3110880 A JP 3110880A JP S56126926 A JPS56126926 A JP S56126926A
Authority
JP
Japan
Prior art keywords
projection type
exposure machine
surface exposure
holding tool
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3110880A
Other languages
Japanese (ja)
Inventor
Sadami Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3110880A priority Critical patent/JPS56126926A/en
Publication of JPS56126926A publication Critical patent/JPS56126926A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the adhesion of dust on a lower photomask and improve the yield of a device by providing a mask holder with a clean air flowing device. CONSTITUTION:A photomask 2 is previously set to a lower mask holder 1 of a projection type both surface exposure machine. The holder 1 is set to a holding tool 3 with a device 6 flowing clean air to the front from the back. Only the front of the device 6 is opened, and the circumference of the holding tool 3 is covered with the device 6. According to this constitution, dust does not infiltrate from the circumference of the holding tool during exposure, defective exposure is not generated and the yield of a device is improved.
JP3110880A 1980-03-12 1980-03-12 Projection type both surface exposure machine Pending JPS56126926A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3110880A JPS56126926A (en) 1980-03-12 1980-03-12 Projection type both surface exposure machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3110880A JPS56126926A (en) 1980-03-12 1980-03-12 Projection type both surface exposure machine

Publications (1)

Publication Number Publication Date
JPS56126926A true JPS56126926A (en) 1981-10-05

Family

ID=12322200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3110880A Pending JPS56126926A (en) 1980-03-12 1980-03-12 Projection type both surface exposure machine

Country Status (1)

Country Link
JP (1) JPS56126926A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105152A (en) * 1981-12-17 1983-06-22 Telmec Co Ltd Dust remover for original plate in lithographic printer
JPS62198122A (en) * 1986-02-26 1987-09-01 Hitachi Ltd Semiconductor processor
JPS62295053A (en) * 1986-06-16 1987-12-22 Sumio Yokoyama Photoplotter
JP2001194801A (en) * 2000-01-14 2001-07-19 Toshiba Corp Exposure device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105152A (en) * 1981-12-17 1983-06-22 Telmec Co Ltd Dust remover for original plate in lithographic printer
JPS62198122A (en) * 1986-02-26 1987-09-01 Hitachi Ltd Semiconductor processor
JPS62295053A (en) * 1986-06-16 1987-12-22 Sumio Yokoyama Photoplotter
JP2001194801A (en) * 2000-01-14 2001-07-19 Toshiba Corp Exposure device

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