JPS58105152A - Dust remover for original plate in lithographic printer - Google Patents

Abstract

PURPOSE:To eliminate the defects of patterns, by providing mechanisms for inspecting original plates for presence or absence of dust and sizes thereof in places where the plates are printed and removing the dust present on the plates. CONSTITUTION:The bottom surface of an original plate 6 is swept over the entire surface thereof by moving mechanisms 28, 29 which move the locus of the light 2 from a laser device 1 mounted to a frame 5 in X-Y directions. The reflection that arises when the laser light shines on foreign matters and dust is detected with a photodetector 3, and the position thereof is stored. A vacuum suction port 7 is moved to said position and the foreign matters or dust are removed by vacuum. If dust sticks on the original plate by static electricity, a corona discharger 15 is used. More specifically, high voltage is applied to the destaticizing bar of the corona discharger and corona is discharged from the tip of the stylus to ionize the air around the stylus and to neutralize the electrostatic charge of dust 29 and the electrostatic charge of the original plate 6, whereby the dust 29 is easily removed.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for detecting dust on a photographic original plate and removing the dust.

Demand for 0-LSI and fine patterns is increasing. When such a pattern is printed onto a wafer, there is a high probability that a pattern different from the original will be formed on the silicon wafer. The main cause of this is dust adhering to the original plate.

In the case of the conventional batch exposure, a part of the original plate with dust attached is printed as a defective product, but the printing material is printed onto the wafer using a lens using an original plate several times or 10 times larger than the pattern. In the case of reduced projection, all the individually printed parts will be defective.

In order to avoid this situation, it is effective to find individual dust particles on the original plate and remove them.

Furthermore, considering the configuration of the devices currently on the market, the location where the original is inspected is different from the location where the actual printing is performed, so there is a possibility that dust, etc. may re-adhere to the original that has been inspected during transportation. be.

An object of the present invention is to provide a mechanism for inspecting the presence and size of dust at the actual printing location and removing dust if found.

There are two ways to remove dust: one is to use a Makabe to simply remove the dust attached to the original, and the other is to use static electricity to make the original electrically neutral and remove it from the original using corona discharge. Hereinafter, drawings showing embodiments of the present invention will be described.

FIG. 1 shows a cross section of a 10:1 reduction exposure apparatus equipped with a dust removal apparatus according to the present invention. The configuration of the apparatus is as follows: A glass original plate shown at 6 is illuminated using an illumination system shown at 8, and its image is passed through a group of lenses shown at 9, and a silicon wafer plate shown at 10 is placed on a stage shown at 13. It has a mechanism that reduces the image of the original plate to one-tenth and transfers it.

The pattern on the original plate is attached so that it is on the bottom surface of the glass shown at 6, so if dust, etc., as shown at 14, adheres to this bottom surface as shown in Figure 2, this will cause the image to appear on the wafer. It is imaged as Moreover, this becomes a defect and causes a failure when manufacturing the machine 'c-r#x.

1 in FIG. 1 is a laser device attached to a frame indicated by 5.

A frame indicated by 5 is provided on the substrate 11 and is moved in the X-Y direction by a moving mechanism indicated by 28 and 29.
It is possible to sweep the trajectory of light shown by 6 over the entire lower surface of the original plate shown by 6.

Further, the above-mentioned sweeping of the laser beam on the original plate 6 may be performed as follows.

Fix the frame shown in 5 using the X-Y movement mechanism 4
It is also effective to rotate the reflecting mirror 4 so as to sweep the trajectory of light shown by 2 over the entire surface of the original 6 using the reflecting mirror shown in FIG.

In this way, when the laser beam sweeping the lower surface of the original 6 hits foreign matter, dust, etc., a phenomenon of diffuse reflection occurs on the original.

This reflection is detected by a photodetector 6, and at the same time, the position on the original where the dust was detected is memorized.

Next, the vacuum suction port 7 is moved to the position where dust on the original is detected, and the dust is removed by vacuum.

Installation of the suction lower 1. The base indicated by 26 is the third
It is freely swept in the X-Y direction by the mechanism shown in the figure, and dust on the original is removed by vacuum.

As a drive method, when the motor shown at 18 is driven and the screw shaft shown at 26 is rotated via the reducer shown at 22, the base shown at 19 moves in the X direction along both guides shown at 17. .

Next, when the motor shown at 20 is driven and the screw shaft shown at 24 is rotated through the reducer shown at 21, the base shown at 26 having a vacuum suction port shown at 7 is moved along the guide shown at 25. moves in the Y-axis direction.

Through the movement of these two axes, the entire surface of the original is swept, and dust is removed using the suction port.

In FIG. 4, when the original plate shown at 6 is charged, positively or negatively charged dust as shown at 29 is attached to the original plate.

A corona discharge device shown at 15 is used to remove dust caused by static electricity.

This device is used to remove various types of electrical charges (5) It has a sharp discharge needle.

A high voltage is applied to the static eliminating rod indicated by 15 to cause corona discharge to occur from the tip of the needle, ionizing the air around the needle, and
By creating positive and negative ions as shown in 6,
The electric charge of the original plate shown by 6 and the electric charge of dust shown by 29 are neutralized without contact to facilitate the removal of dust.

Although one embodiment of the dust removal device according to the present invention has been described above, various other embodiments can be devised without changing the gist of the present invention.

[Brief explanation of the drawing]

FIG. 1 is a diagram showing a cross section of a photolithography apparatus equipped with a dust removal device according to the present invention, FIG. 2 is a diagram showing the concept of a method for removing dust on an original, and FIG. FIG. 4 is a view of the vacuum nozzle mechanism seen from the top of the main body, and is a diagram showing a method for removing dust attracted to the original plate by static electricity. Patent applicant Chilmek Co., Ltd. (6) Fig. 2 Fig. 3 M4 Fig.

Claims (1)

[Claims] 1. A vacuum suction port that can be moved near the dust attached to the original plate of the printing device, a drive device for moving the vacuum suction port f in the x and Y directions, and the dust is removed. The photolithographic printing equipment has a dust inspection device to confirm that it has been used. 2. The device according to claim 1 is equipped with an air blowing port instead of the vacuum suction port. 3. The device according to claim 1 or 2, which is equipped with a corona discharge device for the purpose of facilitating removal of dust.