JPS56120183A - Semiconductor laser element - Google Patents
Semiconductor laser elementInfo
- Publication number
- JPS56120183A JPS56120183A JP2391080A JP2391080A JPS56120183A JP S56120183 A JPS56120183 A JP S56120183A JP 2391080 A JP2391080 A JP 2391080A JP 2391080 A JP2391080 A JP 2391080A JP S56120183 A JPS56120183 A JP S56120183A
- Authority
- JP
- Japan
- Prior art keywords
- stripes
- electrode
- substrate
- longitudinal direction
- growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To decrease a threshold value current by setting a striped electrode of a laser element having an epitaxial layer containing three kinds of elements among In, Ga, As and P so that the longitudinal direction thereof may correspond with the strong direction of the lattice stripes of a substrate on the (100) surface of the substrate containing Ga, P and As. CONSTITUTION:The growth values of GaAsP on the (100) surface of GaAs occur the lattice stripes having uneveness which cross at right angles one another in the (110) direction, said stripes being plentiful in the horizontal CD direction, but few in the longitudinal direction. A double hetero-epitaxial growth is performed by a liquid phase on such substrate. The first clad layer 2, active layer 3, and a second clad layer 4 are allowed to grow on a GaAsP. In this case, the sectional surface (cleveage) of AB has a plenty of uneveness, but the sectional surface of CD is a very even growth surface. When the stripes electrode is formed on the wafer, if the longitudinal direction of the electrode is formed parallel to the CD direction, the threshold value current can decreased extremely.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2391080A JPS56120183A (en) | 1980-02-27 | 1980-02-27 | Semiconductor laser element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2391080A JPS56120183A (en) | 1980-02-27 | 1980-02-27 | Semiconductor laser element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56120183A true JPS56120183A (en) | 1981-09-21 |
JPS6249999B2 JPS6249999B2 (en) | 1987-10-22 |
Family
ID=12123629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2391080A Granted JPS56120183A (en) | 1980-02-27 | 1980-02-27 | Semiconductor laser element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56120183A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58102970A (en) * | 1981-12-16 | 1983-06-18 | Konishiroku Photo Ind Co Ltd | Laser recorder |
-
1980
- 1980-02-27 JP JP2391080A patent/JPS56120183A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58102970A (en) * | 1981-12-16 | 1983-06-18 | Konishiroku Photo Ind Co Ltd | Laser recorder |
Also Published As
Publication number | Publication date |
---|---|
JPS6249999B2 (en) | 1987-10-22 |
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