JPS56112471A - Sputtering device - Google Patents

Sputtering device

Info

Publication number
JPS56112471A
JPS56112471A JP1430980A JP1430980A JPS56112471A JP S56112471 A JPS56112471 A JP S56112471A JP 1430980 A JP1430980 A JP 1430980A JP 1430980 A JP1430980 A JP 1430980A JP S56112471 A JPS56112471 A JP S56112471A
Authority
JP
Japan
Prior art keywords
led
substrate
target
sputtering
opposing surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1430980A
Other languages
Japanese (ja)
Inventor
Reiji Nishikawa
Makoto Tani
Shozo Satoyama
Yoshinori Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1430980A priority Critical patent/JPS56112471A/en
Publication of JPS56112471A publication Critical patent/JPS56112471A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain a sputtering device which forms a thin film of metal continuously and uniformly on the film substrate without causing curling and deforming, by consituting so as to lower the temp. of a film substrate by means of cooling elements provided between the plural sputtering regions of a film substrate conveying path. CONSTITUTION:In a vacuum vessel 1, a film substrate 8 is rewound from a supply reel 9, is guided by a tape guide 10a and is led to the target opposing surface of a substrate holde 6a. After said 8 has run on this opposing surface, it is led to metal- made rotator 11a-11c parts which are cooling elements, by a tape guide 10b, and further it is led to the target opposing surface of a substrate holder 6b by a tape guide 10c, after which it is taken up by a take-up reel 12. During this time, a thin film of sputtering is formed in the 1st region by a target 4a on the substrate 8 led by the reel 9, after which the heat evolved is removed by said rorators. Thence, it is led to the 2nd region to form a thin film of sputtering by a target 4b.
JP1430980A 1980-02-08 1980-02-08 Sputtering device Pending JPS56112471A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1430980A JPS56112471A (en) 1980-02-08 1980-02-08 Sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1430980A JPS56112471A (en) 1980-02-08 1980-02-08 Sputtering device

Publications (1)

Publication Number Publication Date
JPS56112471A true JPS56112471A (en) 1981-09-04

Family

ID=11857490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1430980A Pending JPS56112471A (en) 1980-02-08 1980-02-08 Sputtering device

Country Status (1)

Country Link
JP (1) JPS56112471A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179952A (en) * 1981-04-24 1982-11-05 Fuji Photo Film Co Ltd Method and apparatus for magnetic recording medium
EP0082001A1 (en) * 1981-12-16 1983-06-22 General Engineering Radcliffe 1979 Limited Apparatus for and a method of metallising a length of material
JPS58136777A (en) * 1982-02-09 1983-08-13 Hitachi Ltd Thin film forming device by sputtering
JPS5921662U (en) * 1982-07-30 1984-02-09 株式会社徳田製作所 sputtering equipment
JPS59162274A (en) * 1983-03-07 1984-09-13 Anelva Corp Continuous producing device for thin film
JPS6320483A (en) * 1986-07-15 1988-01-28 Canon Inc Fine particle spraying device
EP0672762A1 (en) * 1994-03-18 1995-09-20 GALILEO VACUUM TEC S.p.A. Apparatus for continuous vacuum metallization
EP4249841A3 (en) * 2019-03-20 2023-11-29 Fujitsu General Limited Heat exchanger

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179952A (en) * 1981-04-24 1982-11-05 Fuji Photo Film Co Ltd Method and apparatus for magnetic recording medium
JPH0435810B2 (en) * 1981-04-24 1992-06-12 Fuji Photo Film Co Ltd
EP0082001A1 (en) * 1981-12-16 1983-06-22 General Engineering Radcliffe 1979 Limited Apparatus for and a method of metallising a length of material
JPS58136777A (en) * 1982-02-09 1983-08-13 Hitachi Ltd Thin film forming device by sputtering
JPS6160908B2 (en) * 1982-02-09 1986-12-23 Hitachi Ltd
JPS5921662U (en) * 1982-07-30 1984-02-09 株式会社徳田製作所 sputtering equipment
JPS5935580Y2 (en) * 1982-07-30 1984-10-01 株式会社徳田製作所 sputtering equipment
JPS59162274A (en) * 1983-03-07 1984-09-13 Anelva Corp Continuous producing device for thin film
JPS6320483A (en) * 1986-07-15 1988-01-28 Canon Inc Fine particle spraying device
EP0672762A1 (en) * 1994-03-18 1995-09-20 GALILEO VACUUM TEC S.p.A. Apparatus for continuous vacuum metallization
EP4249841A3 (en) * 2019-03-20 2023-11-29 Fujitsu General Limited Heat exchanger

Similar Documents

Publication Publication Date Title
JPS5483622A (en) Heat treatment method for amorphous magnetic alloy sheet
JPS56112471A (en) Sputtering device
JPS5216538A (en) Method for peeling off a flexible film
NO153420C (en) DEVICE FOR THE SUPPLY OF METAL MELTS BY STRANDING OF BANDS IN BELT COOKILLES.
EP0122326A3 (en) Method and apparatus for manufacturing security strips
JPS52115785A (en) Process for coating substrate
JPS54138371A (en) Solder supplying method
JPS57140824A (en) Heat treatment of thin strip of amorphous magnetic alloy for magnetostrictive delay wire
JPS5488114A (en) Manufacturing device for photograph seal
JPS5774377A (en) Method of peeling off adhesive tape from adhesive tape-converted metallic material
JPS5339226A (en) Deposition method of hafnium metal thin film
JPS5320065A (en) Tape winding process and device for winding tape
JPS56113634A (en) Supplier for thin and flat goods
JPS57155368A (en) Method of recovering vacuum deposition liquid material and apparatus therefor
JPS56162682A (en) Ink ribbon cassette
JPS56104022A (en) Sticking method for evaporation film
JPS5333984A (en) Process for coating cemented carbide alloy with film
JPS525682A (en) Sputtering apparatus for long length substrates
JPS54147780A (en) Carrier tape
JPS5345254A (en) Thin film mirror
JPS561373A (en) Device for preparing heat-fluorescence intensitometer element
JPS53139648A (en) Formation of electrostatic coating on ferromagentic material
JPS6453419A (en) Resist coating device
JPS54122641A (en) Soft solder joining apparatus for strip
JPS5254603A (en) Cooling mthod of hot strip coil