JPS56111039A - Gas treating method - Google Patents

Gas treating method

Info

Publication number
JPS56111039A
JPS56111039A JP1231080A JP1231080A JPS56111039A JP S56111039 A JPS56111039 A JP S56111039A JP 1231080 A JP1231080 A JP 1231080A JP 1231080 A JP1231080 A JP 1231080A JP S56111039 A JPS56111039 A JP S56111039A
Authority
JP
Japan
Prior art keywords
gas
reacting
exhaust gas
nozzle
fed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1231080A
Other languages
Japanese (ja)
Other versions
JPS5849293B2 (en
Inventor
Sumio Fujita
Sotoharu Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP55012310A priority Critical patent/JPS5849293B2/en
Publication of JPS56111039A publication Critical patent/JPS56111039A/en
Publication of JPS5849293B2 publication Critical patent/JPS5849293B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE: To prevent scaling on inside wall effectively, in a gas treating method in which gas-liquid or gas-solid contact is accomplished, by recirculating the treated gas through a piping thereby producing the swirling flow on the inner side of the cylindrical part of the device along the inside wall thereof.
CONSTITUTION: At the time when a reacting gas enters the device through a gas inlet 1 and is released as an exhaust gas 3 after completing chemical reaction, part of said exhaust gas is sucked and is fed into a reaction tower by providing a pipe 6 and a fan F. The circulating exhaust gas fed therein creates strong swirling flow constantly on the inner side of the side wall of the reaction tower, thereby preventing the powder and slurry mist of the reacting agent sprayed from a nozzle 5 from scaling on the inner side of the reactor. It is possible to mix the reacting gas entering the tower inside through the gas inlet 1 with the reacting agent necessary for treating this at a sufficient amount by spraying the same from the nozzle 5.
COPYRIGHT: (C)1981,JPO&Japio
JP55012310A 1980-02-04 1980-02-04 Gas processing method Expired JPS5849293B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55012310A JPS5849293B2 (en) 1980-02-04 1980-02-04 Gas processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55012310A JPS5849293B2 (en) 1980-02-04 1980-02-04 Gas processing method

Publications (2)

Publication Number Publication Date
JPS56111039A true JPS56111039A (en) 1981-09-02
JPS5849293B2 JPS5849293B2 (en) 1983-11-02

Family

ID=11801737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55012310A Expired JPS5849293B2 (en) 1980-02-04 1980-02-04 Gas processing method

Country Status (1)

Country Link
JP (1) JPS5849293B2 (en)

Also Published As

Publication number Publication date
JPS5849293B2 (en) 1983-11-02

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