JPS56108284A - Semiconductor light detector - Google Patents
Semiconductor light detectorInfo
- Publication number
- JPS56108284A JPS56108284A JP1008780A JP1008780A JPS56108284A JP S56108284 A JPS56108284 A JP S56108284A JP 1008780 A JP1008780 A JP 1008780A JP 1008780 A JP1008780 A JP 1008780A JP S56108284 A JPS56108284 A JP S56108284A
- Authority
- JP
- Japan
- Prior art keywords
- region
- junction
- type
- sensitivity
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 230000035945 sensitivity Effects 0.000 abstract 4
- 230000003595 spectral effect Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PN homojunction type
Abstract
PURPOSE:To improve the long-wavelength side sensitivity of a semiconductor light detector by decreasing the forbidden band width of one of the semiconductor layers forming a junction as the distance from the junction increases. CONSTITUTION:Formed on an n<+> substrate 1 is an active region 2 with a conductivity type (p type) different from that of the substrate 1 and having lower impurity concentration than it. When the region 2 is formed, Ge is mixed therein. The mixing mol ratio, Ge/Si, is 0 at the junction J and gradually increases as the distance from the junction increases. Then, an n type diffused region 3 is formed in the region 2, and moreover a p<+> type diffused region 4 is formed therein. Thereafter, an oxide film 5 is formed as a surface protecting film, followed by a reflection preventing film 6 and electrodes 7 and 8. When a reverse bias is applied between the electrodes 7 and 8 of the element thus produced, the region 2 becomes a depletion layer, so that a photodiode capable of high-speed response can be obtained. The spectral sensitivity characteristic of such a photodiode is improved in the sensitivity at the Si absorption end and in longer wavelength bands than that, so that the spectral sensitivity range widens.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1008780A JPS56108284A (en) | 1980-02-01 | 1980-02-01 | Semiconductor light detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1008780A JPS56108284A (en) | 1980-02-01 | 1980-02-01 | Semiconductor light detector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56108284A true JPS56108284A (en) | 1981-08-27 |
Family
ID=11740549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1008780A Pending JPS56108284A (en) | 1980-02-01 | 1980-02-01 | Semiconductor light detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56108284A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61224352A (en) * | 1985-03-29 | 1986-10-06 | Matsushita Electronics Corp | Solid-state image pickup device |
JPH11121729A (en) * | 1997-08-20 | 1999-04-30 | Internatl Business Mach Corp <Ibm> | Band gap designed active pickcell cell |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5421294A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Avalanche photo diode |
-
1980
- 1980-02-01 JP JP1008780A patent/JPS56108284A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5421294A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Avalanche photo diode |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61224352A (en) * | 1985-03-29 | 1986-10-06 | Matsushita Electronics Corp | Solid-state image pickup device |
JPH11121729A (en) * | 1997-08-20 | 1999-04-30 | Internatl Business Mach Corp <Ibm> | Band gap designed active pickcell cell |
US6278102B1 (en) | 1997-08-20 | 2001-08-21 | International Business Machines Corporation | Method of detecting electromagnetic radiation with bandgap engineered active pixel cell design |
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