JPS559447A - Electron ray exposure device - Google Patents

Electron ray exposure device

Info

Publication number
JPS559447A
JPS559447A JP8227078A JP8227078A JPS559447A JP S559447 A JPS559447 A JP S559447A JP 8227078 A JP8227078 A JP 8227078A JP 8227078 A JP8227078 A JP 8227078A JP S559447 A JPS559447 A JP S559447A
Authority
JP
Japan
Prior art keywords
exposure
hsc9
standard section
drawn
new
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8227078A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231489B2 (enExample
Inventor
Itsuo Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP8227078A priority Critical patent/JPS559447A/ja
Publication of JPS559447A publication Critical patent/JPS559447A/ja
Publication of JPS6231489B2 publication Critical patent/JPS6231489B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP8227078A 1978-07-06 1978-07-06 Electron ray exposure device Granted JPS559447A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8227078A JPS559447A (en) 1978-07-06 1978-07-06 Electron ray exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8227078A JPS559447A (en) 1978-07-06 1978-07-06 Electron ray exposure device

Publications (2)

Publication Number Publication Date
JPS559447A true JPS559447A (en) 1980-01-23
JPS6231489B2 JPS6231489B2 (enExample) 1987-07-08

Family

ID=13769783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8227078A Granted JPS559447A (en) 1978-07-06 1978-07-06 Electron ray exposure device

Country Status (1)

Country Link
JP (1) JPS559447A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577136A (en) * 1978-12-06 1980-06-10 Fujitsu Ltd Electron beam exposure control system
JPS5730331A (en) * 1980-07-31 1982-02-18 Nec Corp Method for exposure of electron beam

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52113683A (en) * 1976-03-19 1977-09-22 Nec Corp Electron beam stabilizing time control circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52113683A (en) * 1976-03-19 1977-09-22 Nec Corp Electron beam stabilizing time control circuit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577136A (en) * 1978-12-06 1980-06-10 Fujitsu Ltd Electron beam exposure control system
JPS5730331A (en) * 1980-07-31 1982-02-18 Nec Corp Method for exposure of electron beam

Also Published As

Publication number Publication date
JPS6231489B2 (enExample) 1987-07-08

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