JPS5587434A - Antistatic method at electron beam exposure - Google Patents

Antistatic method at electron beam exposure

Info

Publication number
JPS5587434A
JPS5587434A JP16316878A JP16316878A JPS5587434A JP S5587434 A JPS5587434 A JP S5587434A JP 16316878 A JP16316878 A JP 16316878A JP 16316878 A JP16316878 A JP 16316878A JP S5587434 A JPS5587434 A JP S5587434A
Authority
JP
Japan
Prior art keywords
substrate
electron beam
beam exposure
support
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16316878A
Other languages
English (en)
Other versions
JPS5925370B2 (ja
Inventor
Takayuki Nakagawa
Shuzo Oshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16316878A priority Critical patent/JPS5925370B2/ja
Publication of JPS5587434A publication Critical patent/JPS5587434A/ja
Publication of JPS5925370B2 publication Critical patent/JPS5925370B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP16316878A 1978-12-26 1978-12-26 半導体装置の製造方法 Expired JPS5925370B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16316878A JPS5925370B2 (ja) 1978-12-26 1978-12-26 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16316878A JPS5925370B2 (ja) 1978-12-26 1978-12-26 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5587434A true JPS5587434A (en) 1980-07-02
JPS5925370B2 JPS5925370B2 (ja) 1984-06-16

Family

ID=15768519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16316878A Expired JPS5925370B2 (ja) 1978-12-26 1978-12-26 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5925370B2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712668A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS603400U (ja) * 1983-06-22 1985-01-11 富士工器株式会社 Ｌｐガス容器用キヤツプ
JP2001210664A (ja) * 1999-07-02 2001-08-03 Matsushita Electric Ind Co Ltd 電荷発生半導体基板用バンプ形成装置、電荷発生半導体基板の除電方法、電荷発生半導体基板用除電装置、及び電荷発生半導体基板
US6818975B1 (en) 1999-07-02 2004-11-16 Matsushita Electric Industrial Co., Ltd. Electric charge generating semiconductor substrate bump forming device, method of removing electric charge from electric charge generating semiconductor substrate device for removing electric charge from electric charge generating semiconductor substrate, and electric charge generating semiconductor substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712668A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS6330150B2 (ja) * 1980-06-27 1988-06-16 Nippon Electric Co
JPS603400U (ja) * 1983-06-22 1985-01-11 富士工器株式会社 Ｌｐガス容器用キヤツプ
JP2001210664A (ja) * 1999-07-02 2001-08-03 Matsushita Electric Ind Co Ltd 電荷発生半導体基板用バンプ形成装置、電荷発生半導体基板の除電方法、電荷発生半導体基板用除電装置、及び電荷発生半導体基板
US6818975B1 (en) 1999-07-02 2004-11-16 Matsushita Electric Industrial Co., Ltd. Electric charge generating semiconductor substrate bump forming device, method of removing electric charge from electric charge generating semiconductor substrate device for removing electric charge from electric charge generating semiconductor substrate, and electric charge generating semiconductor substrate
US7005368B1 (en) 1999-07-02 2006-02-28 Matsushita Electric Industrial Co., Ltd. Bump forming apparatus for charge appearance semiconductor substrate, charge removal method for charge appearance semiconductor substrate, charge removing unit for charge appearance semiconductor substrate, and charge appearance semiconductor substrate
US7014092B2 (en) 1999-07-02 2006-03-21 Matsushita Electric Industrial Co., Ltd. Bump forming apparatus for charge appearance semiconductor substrate, charge removal method for charge appearance semiconductor substrate, charge removing unit for charge appearance semiconductor substrate, and charge appearance semiconductor substrate

Also Published As

Publication number Publication date
JPS5925370B2 (ja) 1984-06-16

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