JPS5567725A - Forming method of electrode for display - Google Patents

Forming method of electrode for display

Info

Publication number
JPS5567725A
JPS5567725A JP14071978A JP14071978A JPS5567725A JP S5567725 A JPS5567725 A JP S5567725A JP 14071978 A JP14071978 A JP 14071978A JP 14071978 A JP14071978 A JP 14071978A JP S5567725 A JPS5567725 A JP S5567725A
Authority
JP
Japan
Prior art keywords
dry film
substrate
electrodes
display device
low temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14071978A
Other languages
Japanese (ja)
Inventor
Toshiyuki Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP14071978A priority Critical patent/JPS5567725A/en
Publication of JPS5567725A publication Critical patent/JPS5567725A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE: To achieve the reduction in process, reduce orientation defect and make possible fine patterning by laminating a dry film on a substrate then forming patterns and forming electrodes through low temperature sputtering.
CONSTITUTION: For example, in the formation of the transparent electrodes of a liquid crystal display device, a dry film 2 is laminated on a glass substrate 1 and after it is masked, it is subjected to exposure and developing, whereby patterns are formed. This is set in a low temperature sputter device and transparent electrode material such as InO3, SnO3 or the like is sputtered to thicknesses of 200W400Å at the surface temperature 50°C or less of the substrate 1, thence the dry film is peeled, whereby pattern electrodes 3 are formed. In this way, considerable rationalization may be achieved and yet the display device of the quality equivalent to that by conventional methods may be obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP14071978A 1978-11-14 1978-11-14 Forming method of electrode for display Pending JPS5567725A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14071978A JPS5567725A (en) 1978-11-14 1978-11-14 Forming method of electrode for display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14071978A JPS5567725A (en) 1978-11-14 1978-11-14 Forming method of electrode for display

Publications (1)

Publication Number Publication Date
JPS5567725A true JPS5567725A (en) 1980-05-22

Family

ID=15275109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14071978A Pending JPS5567725A (en) 1978-11-14 1978-11-14 Forming method of electrode for display

Country Status (1)

Country Link
JP (1) JPS5567725A (en)

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