JPS5567138A - Method of exposure to electron beam - Google Patents

Method of exposure to electron beam

Info

Publication number
JPS5567138A
JPS5567138A JP14139778A JP14139778A JPS5567138A JP S5567138 A JPS5567138 A JP S5567138A JP 14139778 A JP14139778 A JP 14139778A JP 14139778 A JP14139778 A JP 14139778A JP S5567138 A JPS5567138 A JP S5567138A
Authority
JP
Japan
Prior art keywords
sample
temperature
exposure
electron beam
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14139778A
Other languages
Japanese (ja)
Inventor
Hiroaki Okuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP14139778A priority Critical patent/JPS5567138A/en
Publication of JPS5567138A publication Critical patent/JPS5567138A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the accuracy of patterning from falling due to the thermal expansion or contraction of a sample when moving an electron beam and the sample relatively to each other to expose the sample in a prescribed pattern to the electron beam, by detecting the temperature of the sample to stop the exposure when the temperature is higher than an allowable range. CONSTITUTION:An electron beam 3 is provided in the upper end of a column 1 of an exposure system. A sample 7 is set on a sample holder 9 in a working chamber 2 in the lower end of the column. Deflection means comprising 8X, 8Y, a blanking unit 4, converging lenses 5, 6 and electrostatic deflection plates are provided between the electron gun 3 and the sample holder 9. A temperature detector 11 is mounted on a rest 10 whereon the holder 9 is provided. The temperature detector 11 is placed in contact with the holder 9 or the sample 7. The output of the detector is applied to a comparison circuit 13 connected to a reference power source 14 through a detection circuit 12. The computer 15 is operated by the output of the comparison circuit to stop exposure when the temperature of the sample 7 exceeds an allowable level and to resume the exposure when the temperature falls below the level.
JP14139778A 1978-11-16 1978-11-16 Method of exposure to electron beam Pending JPS5567138A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14139778A JPS5567138A (en) 1978-11-16 1978-11-16 Method of exposure to electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14139778A JPS5567138A (en) 1978-11-16 1978-11-16 Method of exposure to electron beam

Publications (1)

Publication Number Publication Date
JPS5567138A true JPS5567138A (en) 1980-05-21

Family

ID=15291037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14139778A Pending JPS5567138A (en) 1978-11-16 1978-11-16 Method of exposure to electron beam

Country Status (1)

Country Link
JP (1) JPS5567138A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106764A (en) * 1989-04-10 1992-04-21 At&T Bell Laboratories Device fabrication

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106764A (en) * 1989-04-10 1992-04-21 At&T Bell Laboratories Device fabrication

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