JPS556497A - Method for forming high temperature oxidation resistant metallizing film - Google Patents

Method for forming high temperature oxidation resistant metallizing film

Info

Publication number
JPS556497A
JPS556497A JP8051979A JP8051979A JPS556497A JP S556497 A JPS556497 A JP S556497A JP 8051979 A JP8051979 A JP 8051979A JP 8051979 A JP8051979 A JP 8051979A JP S556497 A JPS556497 A JP S556497A
Authority
JP
Japan
Prior art keywords
metallizing film
high temperature
temperature oxidation
oxidation resistant
forming high
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8051979A
Other languages
Japanese (ja)
Other versions
JPS5636216B2 (en
Inventor
Hiroshi Ito
Yasuro Mihashi
Hidemoto Takezaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Tungsten Co Ltd
Original Assignee
Nippon Tungsten Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Tungsten Co Ltd filed Critical Nippon Tungsten Co Ltd
Priority to JP8051979A priority Critical patent/JPS556497A/en
Publication of JPS556497A publication Critical patent/JPS556497A/en
Publication of JPS5636216B2 publication Critical patent/JPS5636216B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

PURPOSE:To improve high temperature oxidation resistance by sealing the pores of the metallizing film of tungsten-chromium-silicon alloy. CONSTITUTION:The metallizing film composed of W; 50 to 65%, Cr; 30 to 40%, Si; 5 to 10% based on weight is dipped in a chromium nitrate solution. The chromium nitrate solution is impregated in the pores of the metallizing film through, e.g., ultrasonic vibration. Next, this is thermally decomposed at a temperature of, e.g., 300 deg.C, in air to change this to chromium oxide. The oxidation increase quantities of the sample having undergone this treatment and untreated sample in air of 1200 deg.C were 3.4, 6.4 mg/cm<2>.hr, respectively.
JP8051979A 1979-06-25 1979-06-25 Method for forming high temperature oxidation resistant metallizing film Granted JPS556497A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8051979A JPS556497A (en) 1979-06-25 1979-06-25 Method for forming high temperature oxidation resistant metallizing film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8051979A JPS556497A (en) 1979-06-25 1979-06-25 Method for forming high temperature oxidation resistant metallizing film

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP6087776A Division JPS52143933A (en) 1976-05-25 1976-05-25 Method of formiing antioxidizing spray film

Publications (2)

Publication Number Publication Date
JPS556497A true JPS556497A (en) 1980-01-17
JPS5636216B2 JPS5636216B2 (en) 1981-08-22

Family

ID=13720552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8051979A Granted JPS556497A (en) 1979-06-25 1979-06-25 Method for forming high temperature oxidation resistant metallizing film

Country Status (1)

Country Link
JP (1) JPS556497A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9469107B2 (en) 2013-07-12 2016-10-18 Hewlett-Packard Development Company, L.P. Thermal inkjet printhead stack with amorphous metal resistor
US9511585B2 (en) 2013-07-12 2016-12-06 Hewlett-Packard Development Company, L.P. Thermal inkjet printhead stack with amorphous thin metal protective layer
US10177310B2 (en) 2014-07-30 2019-01-08 Hewlett Packard Enterprise Development Lp Amorphous metal alloy electrodes in non-volatile device applications

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4714642A (en) * 1983-08-30 1987-12-22 Basf Aktiengesellschaft Carbon fiber multifilamentary tow which is particularly suited for weaving and/or resin impregnation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9469107B2 (en) 2013-07-12 2016-10-18 Hewlett-Packard Development Company, L.P. Thermal inkjet printhead stack with amorphous metal resistor
US9511585B2 (en) 2013-07-12 2016-12-06 Hewlett-Packard Development Company, L.P. Thermal inkjet printhead stack with amorphous thin metal protective layer
US10177310B2 (en) 2014-07-30 2019-01-08 Hewlett Packard Enterprise Development Lp Amorphous metal alloy electrodes in non-volatile device applications

Also Published As

Publication number Publication date
JPS5636216B2 (en) 1981-08-22

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