JPS5551427A - Automatic mixer for liquids - Google Patents

Automatic mixer for liquids

Info

Publication number
JPS5551427A
JPS5551427A JP12434178A JP12434178A JPS5551427A JP S5551427 A JPS5551427 A JP S5551427A JP 12434178 A JP12434178 A JP 12434178A JP 12434178 A JP12434178 A JP 12434178A JP S5551427 A JPS5551427 A JP S5551427A
Authority
JP
Japan
Prior art keywords
liquid
tank
automatic valve
mixing
liquids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12434178A
Other languages
Japanese (ja)
Inventor
Kazuhiko Sakaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP12434178A priority Critical patent/JPS5551427A/en
Publication of JPS5551427A publication Critical patent/JPS5551427A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/49—Mixing systems, i.e. flow charts or diagrams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2112—Level of material in a container or the position or shape of the upper surface of the material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/88—Forming a predetermined ratio of the substances to be mixed by feeding the materials batchwise

Abstract

PURPOSE:To regulate the dilution rate or mixing ratio of mixed liquids optionally and with high accuracy by a simplified operation by mixing automatically two kinds of liquids, e.g., water and a concentrated stock solution, in a desired concentration and proportion. CONSTITUTION:Even under the condition that the tank 1 and the quantitatively weighing tank 3 are connected through the automatic valve 2 for the supply of the stock solution A, only a set amount is housed in the quantitatively weighing tank 3. When mixed liquid is drawn out of the pump 11 and the liquid surface of the mixing tank 4 is lowered to the lowest level LL, the limit switch 6 is switched in comply with the lowest position of the float 5, the automatic valve 2 is closed, and at the same time the automatic valve 2a and the automatic valve 7 for the supply of the other liquid B are opened, whereby definite amounts of the liquid A in the quantitatively weighing tank 3 and the other liquid B are supplied to the mixing tank 4. When the liquid surface reaches the highest level HL, the float 5 reaches the highest position and thereby the switch 6 is switched, the valves 2a and 7 are closed, and the valve 2 is opened.
JP12434178A 1978-10-09 1978-10-09 Automatic mixer for liquids Pending JPS5551427A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12434178A JPS5551427A (en) 1978-10-09 1978-10-09 Automatic mixer for liquids

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12434178A JPS5551427A (en) 1978-10-09 1978-10-09 Automatic mixer for liquids

Publications (1)

Publication Number Publication Date
JPS5551427A true JPS5551427A (en) 1980-04-15

Family

ID=14882950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12434178A Pending JPS5551427A (en) 1978-10-09 1978-10-09 Automatic mixer for liquids

Country Status (1)

Country Link
JP (1) JPS5551427A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002001614A2 (en) * 2000-06-26 2002-01-03 Applied Materials, Inc. Method and apparatus for chemical mixing in a single wafer process
US6927176B2 (en) 2000-06-26 2005-08-09 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process
US7456113B2 (en) 2000-06-26 2008-11-25 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS458768Y1 (en) * 1966-09-12 1970-04-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS458768Y1 (en) * 1966-09-12 1970-04-24

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002001614A2 (en) * 2000-06-26 2002-01-03 Applied Materials, Inc. Method and apparatus for chemical mixing in a single wafer process
WO2002001614A3 (en) * 2000-06-26 2002-04-11 Applied Materials Inc Method and apparatus for chemical mixing in a single wafer process
US6927176B2 (en) 2000-06-26 2005-08-09 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process
US7205023B2 (en) 2000-06-26 2007-04-17 Applied Materials, Inc. Method and apparatus for chemical mixing in a single wafer process
US7449127B2 (en) 2000-06-26 2008-11-11 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process
US7456113B2 (en) 2000-06-26 2008-11-25 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process
US7469883B2 (en) 2000-06-26 2008-12-30 Applied Materials, Inc. Cleaning method and solution for cleaning a wafer in a single wafer process

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