JPS5546190A - Method of and apparatus for measuring interference - Google Patents

Method of and apparatus for measuring interference

Info

Publication number
JPS5546190A
JPS5546190A JP8511479A JP8511479A JPS5546190A JP S5546190 A JPS5546190 A JP S5546190A JP 8511479 A JP8511479 A JP 8511479A JP 8511479 A JP8511479 A JP 8511479A JP S5546190 A JPS5546190 A JP S5546190A
Authority
JP
Japan
Prior art keywords
measuring interference
interference
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8511479A
Other languages
English (en)
Other versions
JPH0137682B2 (ja
Inventor
Eru Fuaarando Kurea
Efu Fuosutaa Buinsento
Eichi Gureisu Uiriamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Farrand Industries Inc
Original Assignee
Farrand Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Farrand Industries Inc filed Critical Farrand Industries Inc
Publication of JPS5546190A publication Critical patent/JPS5546190A/ja
Publication of JPH0137682B2 publication Critical patent/JPH0137682B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/15—Cat eye, i.e. reflection always parallel to incoming beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Materials For Medical Uses (AREA)
  • Paper (AREA)
  • External Artificial Organs (AREA)
JP8511479A 1978-09-28 1979-07-06 Method of and apparatus for measuring interference Granted JPS5546190A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/946,465 US4215938A (en) 1978-09-28 1978-09-28 Method and apparatus for correcting the error of a position measuring interferometer

Publications (2)

Publication Number Publication Date
JPS5546190A true JPS5546190A (en) 1980-03-31
JPH0137682B2 JPH0137682B2 (ja) 1989-08-09

Family

ID=25484502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8511479A Granted JPS5546190A (en) 1978-09-28 1979-07-06 Method of and apparatus for measuring interference

Country Status (13)

Country Link
US (1) US4215938A (ja)
JP (1) JPS5546190A (ja)
AU (1) AU4927179A (ja)
BR (1) BR7904550A (ja)
CA (1) CA1147950A (ja)
DE (1) DE2929945A1 (ja)
ES (1) ES482034A1 (ja)
FR (1) FR2437609A1 (ja)
GB (1) GB2032098B (ja)
IL (1) IL57686A (ja)
IT (1) IT1119125B (ja)
NO (1) NO793115L (ja)
SE (1) SE7903801L (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6085302A (ja) * 1983-07-15 1985-05-14 デイメテツク・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング ２ビ−ムレ−ザ干渉計原理に基ずく長さ測定装置
JPS60225005A (ja) * 1984-04-24 1985-11-09 Tokyo Erekutoron Kk レ−ザ−光を利用した位置決め装置の補正方式
JPS62235506A (ja) * 1985-12-19 1987-10-15 ジゴ−　コ−ポレ−シヨン 差動平面鏡干渉計システム

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100178B1 (en) * 1982-07-14 1988-09-28 Fujitsu Limited Polarizing elements
US4536088A (en) * 1982-09-17 1985-08-20 Rashleigh Scott C Polarimetric Fabry-Perot sensor
US4558952A (en) * 1983-02-22 1985-12-17 Kules Vladimir P Method for measuring an optical length of light path and a laser interferometer for carrying same into effect
US4655587A (en) * 1983-03-07 1987-04-07 Beckman Instruments, Inc. Mirror scan velocity control
JPS60500734A (ja) * 1983-03-07 1985-05-16 ベツクマン・インストルメンツ・インコ−ポレ−テツド 鏡走査速度制御装置
GB2182433B (en) * 1985-11-02 1989-10-25 Stc Plc Remote sensor
JPS62233704A (ja) * 1986-03-28 1987-10-14 ジゴ−　コ−ポレ−シヨン 差動平面鏡干渉計システム
US4890921A (en) * 1986-08-11 1990-01-02 The Boeing Company Scanning interferometer
US4974961A (en) * 1986-09-12 1990-12-04 Jackson David A Optical fibre measuring system
US4765741A (en) * 1987-03-20 1988-08-23 Hewlett-Packard Company Wavelength tracking compensator for an interferometer
US4784489A (en) * 1987-04-29 1988-11-15 Hewlett-Packard Company Fiber-optic based remote receiver for laser interferometer systems
JPH0198902A (ja) * 1987-10-12 1989-04-17 Res Dev Corp Of Japan 光波干渉測長装置
US4939678A (en) * 1987-11-19 1990-07-03 Brown & Sharpe Manufacturing Company Method for calibration of coordinate measuring machine
US4884889A (en) * 1987-11-19 1989-12-05 Brown & Sharpe Manufacturing Company Calibration system for coordinate measuring machine
JPH0674963B2 (ja) * 1988-02-08 1994-09-21 株式会社日立製作所 レーザ干渉測長器及びそれを用いた位置決め方法
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess
EP0508583B1 (en) * 1991-03-08 1997-09-17 Renishaw Transducer Systems Limited Absolute gas refractometer
US5801833A (en) * 1991-03-08 1998-09-01 Dai Nippon Printing Co., Ltd. Method of producing master and working pattern plates for etching and photolithographic apparatus therefor
JPH04331333A (ja) * 1991-05-02 1992-11-19 Canon Inc 波長変化測定装置
JPH0634318A (ja) * 1992-07-14 1994-02-08 Nikon Corp 干渉計測装置
US5585922A (en) * 1992-12-24 1996-12-17 Nikon Corporation Dual interferometer apparatus compensating for environmental turbulence or fluctuation and for quantization error
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
US6124931A (en) * 1997-10-02 2000-09-26 Zygo Corporation Apparatus and methods for measuring intrinsic optical properties of a gas
US6219144B1 (en) 1997-10-02 2001-04-17 Zygo Corporation Apparatus and method for measuring the refractive index and optical path length effects of air using multiple-pass interferometry
US6330065B1 (en) 1997-10-02 2001-12-11 Zygo Corporation Gas insensitive interferometric apparatus and methods
US6509971B2 (en) 2001-05-09 2003-01-21 Nikon Corporation Interferometer system
US6674512B2 (en) 2001-08-07 2004-01-06 Nikon Corporation Interferometer system for a semiconductor exposure system
US6785005B2 (en) 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
US6665054B2 (en) 2001-10-22 2003-12-16 Nikon Corporation Two stage method
US7256871B2 (en) * 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
TWI547771B (zh) 2006-08-31 2016-09-01 尼康股份有限公司 Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining
TWI602032B (zh) 2006-08-31 2017-10-11 Nippon Kogaku Kk Exposure apparatus, exposure method, and device manufacturing method
KR101423017B1 (ko) 2006-08-31 2014-07-28 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
TW201809913A (zh) 2006-09-01 2018-03-16 日商尼康股份有限公司 曝光裝置、曝光方法、以及元件製造方法
TWI622084B (zh) 2006-09-01 2018-04-21 Nikon Corp Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
CN102003935B (zh) * 2010-11-03 2012-10-31 中国科学院光电技术研究所 一种激光跟踪仪测量中环境补偿的方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458259A (en) * 1966-11-07 1969-07-29 Hewlett Packard Co Interferometric system
US3656853A (en) * 1966-11-07 1972-04-18 Hewlett Packard Co Interferometric system
DE1909728B2 (de) * 1969-02-26 1971-02-18 Interferometrische einrichtung
US3647302A (en) * 1970-05-18 1972-03-07 Bendix Corp Apparatus for and method of obtaining precision dimensional measurements
DE2027983A1 (de) * 1970-06-06 1971-12-16 Ibm Deutschland Verfahren zur Fehlerkompensation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6085302A (ja) * 1983-07-15 1985-05-14 デイメテツク・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング ２ビ−ムレ−ザ干渉計原理に基ずく長さ測定装置
JPS60225005A (ja) * 1984-04-24 1985-11-09 Tokyo Erekutoron Kk レ−ザ−光を利用した位置決め装置の補正方式
JPS62235506A (ja) * 1985-12-19 1987-10-15 ジゴ−　コ−ポレ−シヨン 差動平面鏡干渉計システム

Also Published As

Publication number Publication date
GB2032098B (en) 1983-05-25
IT7968625A0 (it) 1979-08-07
DE2929945A1 (de) 1980-04-17
SE7903801L (sv) 1980-03-29
NO793115L (no) 1980-03-31
AU4927179A (en) 1980-04-03
IL57686A (en) 1982-04-30
GB2032098A (en) 1980-04-30
IL57686A0 (en) 1979-10-31
IT1119125B (it) 1986-03-03
JPH0137682B2 (ja) 1989-08-09
CA1147950A (en) 1983-06-14
US4215938A (en) 1980-08-05
ES482034A1 (es) 1980-08-16
FR2437609A1 (fr) 1980-04-25
BR7904550A (pt) 1980-04-15

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