ES482034A1 - Aparato interferometro dotado de haces luminosos de mediciony supervision. - Google Patents

Aparato interferometro dotado de haces luminosos de mediciony supervision.

Info

Publication number
ES482034A1
ES482034A1 ES482034A ES482034A ES482034A1 ES 482034 A1 ES482034 A1 ES 482034A1 ES 482034 A ES482034 A ES 482034A ES 482034 A ES482034 A ES 482034A ES 482034 A1 ES482034 A1 ES 482034A1
Authority
ES
Spain
Prior art keywords
interferometer
correcting
error
position measuring
measuring interferometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES482034A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Farrand Industries Inc
Original Assignee
Farrand Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Farrand Industries Inc filed Critical Farrand Industries Inc
Publication of ES482034A1 publication Critical patent/ES482034A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/15—Cat eye, i.e. reflection always parallel to incoming beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • External Artificial Organs (AREA)
  • Materials For Medical Uses (AREA)
  • Paper (AREA)

Abstract

Aparato interferómetro dotado de haces luminosos de medición y supervisión, que comprende; (a) un primer interferómetro a través del cual se dirige dicho haz de luz medidor hacia un primer reflector, el cual está espaciado a una distancia variable del primer interferómetro, (b) un primer medio medidor asociado al primer interferómetro para la medición e indicación de la distancia en la trayectoria luminosa de medición entre el primer interferómetro y el primer reflector, (c) un segundo interferómetro a través del cual se dirige el haz luminoso de supervisión hacia un segundo reflector, el cual está espaciado a una distancia fija y predeterminada del segundo interferómetro, (d) un segundo medio medidor asociado al segundo interferómetro para la medición o indicación de la distancia en la trayectoria luminosa de supervisión entre el segundo interferómetro y el segundo reflector, (e) medios para acumular el cambio, durante un período de tiempo, de la distancia en la trayectoria luminosa de supervisión medida por el segundo medio medidor, cuyo cambio es causado por una variación en el medio ambiente de dicho aparato, y (f) medios correctores que responden a dichos medios acumuladores y están conectados al primer medio medidor para corregir la citada distancia en la trayectoria luminosa de medición indicada, mediante multiplicación de esta distancia por un factor de corrección correspondiente a la mencionada distancia fija y predeterminada, dividida por la suma de esta última y el referido cambio en la distancia de la trayectoria luminosa de supervisión.
ES482034A 1978-09-28 1979-06-28 Aparato interferometro dotado de haces luminosos de mediciony supervision. Expired ES482034A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/946,465 US4215938A (en) 1978-09-28 1978-09-28 Method and apparatus for correcting the error of a position measuring interferometer

Publications (1)

Publication Number Publication Date
ES482034A1 true ES482034A1 (es) 1980-08-16

Family

ID=25484502

Family Applications (1)

Application Number Title Priority Date Filing Date
ES482034A Expired ES482034A1 (es) 1978-09-28 1979-06-28 Aparato interferometro dotado de haces luminosos de mediciony supervision.

Country Status (13)

Country Link
US (1) US4215938A (es)
JP (1) JPS5546190A (es)
AU (1) AU4927179A (es)
BR (1) BR7904550A (es)
CA (1) CA1147950A (es)
DE (1) DE2929945A1 (es)
ES (1) ES482034A1 (es)
FR (1) FR2437609A1 (es)
GB (1) GB2032098B (es)
IL (1) IL57686A (es)
IT (1) IT1119125B (es)
NO (1) NO793115L (es)
SE (1) SE7903801L (es)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100178B1 (en) * 1982-07-14 1988-09-28 Fujitsu Limited Polarizing elements
US4536088A (en) * 1982-09-17 1985-08-20 Rashleigh Scott C Polarimetric Fabry-Perot sensor
US4558952A (en) * 1983-02-22 1985-12-17 Kules Vladimir P Method for measuring an optical length of light path and a laser interferometer for carrying same into effect
US4655587A (en) * 1983-03-07 1987-04-07 Beckman Instruments, Inc. Mirror scan velocity control
WO1984003558A1 (en) * 1983-03-07 1984-09-13 Beckman Instruments Inc Mirror scan velocity control
US4643577A (en) * 1983-07-15 1987-02-17 Wero Ohg Roth & Co. Length measuring apparatus based on the dual laser beam interferometer principle
JPS60225005A (ja) * 1984-04-24 1985-11-09 Tokyo Erekutoron Kk レ−ザ−光を利用した位置決め装置の補正方式
GB2182433B (en) * 1985-11-02 1989-10-25 Stc Plc Remote sensor
US4752133A (en) * 1985-12-19 1988-06-21 Zygo Corporation Differential plane mirror interferometer
JPS62233704A (ja) * 1986-03-28 1987-10-14 ジゴ−　コ−ポレ−シヨン 差動平面鏡干渉計システム
US4890921A (en) * 1986-08-11 1990-01-02 The Boeing Company Scanning interferometer
US4974961A (en) * 1986-09-12 1990-12-04 Jackson David A Optical fibre measuring system
US4765741A (en) * 1987-03-20 1988-08-23 Hewlett-Packard Company Wavelength tracking compensator for an interferometer
US4784489A (en) * 1987-04-29 1988-11-15 Hewlett-Packard Company Fiber-optic based remote receiver for laser interferometer systems
JPH0198902A (ja) * 1987-10-12 1989-04-17 Res Dev Corp Of Japan 光波干渉測長装置
US4939678A (en) * 1987-11-19 1990-07-03 Brown & Sharpe Manufacturing Company Method for calibration of coordinate measuring machine
US4884889A (en) * 1987-11-19 1989-12-05 Brown & Sharpe Manufacturing Company Calibration system for coordinate measuring machine
JPH0674963B2 (ja) * 1988-02-08 1994-09-21 株式会社日立製作所 レーザ干渉測長器及びそれを用いた位置決め方法
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess
US5801833A (en) * 1991-03-08 1998-09-01 Dai Nippon Printing Co., Ltd. Method of producing master and working pattern plates for etching and photolithographic apparatus therefor
DE69222219T2 (de) * 1991-03-08 1998-01-15 Renishaw Transducer Syst Absolutwert-Gasrefraktometer
JPH04331333A (ja) * 1991-05-02 1992-11-19 Canon Inc 波長変化測定装置
JPH0634318A (ja) * 1992-07-14 1994-02-08 Nikon Corp 干渉計測装置
US5585922A (en) * 1992-12-24 1996-12-17 Nikon Corporation Dual interferometer apparatus compensating for environmental turbulence or fluctuation and for quantization error
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
US6219144B1 (en) 1997-10-02 2001-04-17 Zygo Corporation Apparatus and method for measuring the refractive index and optical path length effects of air using multiple-pass interferometry
US6124931A (en) * 1997-10-02 2000-09-26 Zygo Corporation Apparatus and methods for measuring intrinsic optical properties of a gas
US6330065B1 (en) 1997-10-02 2001-12-11 Zygo Corporation Gas insensitive interferometric apparatus and methods
US6509971B2 (en) 2001-05-09 2003-01-21 Nikon Corporation Interferometer system
US6674512B2 (en) 2001-08-07 2004-01-06 Nikon Corporation Interferometer system for a semiconductor exposure system
US6785005B2 (en) 2001-09-21 2004-08-31 Nikon Corporation Switching type dual wafer stage
US6665054B2 (en) 2001-10-22 2003-12-16 Nikon Corporation Two stage method
US7256871B2 (en) * 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
KR101585359B1 (ko) 2006-08-31 2016-01-14 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
KR101634893B1 (ko) 2006-08-31 2016-06-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP2738608B9 (en) 2006-08-31 2016-08-17 Nikon Corporation Exposure apparatus and exposure method
TWI510871B (zh) 2006-09-01 2015-12-01 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
WO2008029757A1 (en) 2006-09-01 2008-03-13 Nikon Corporation Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
CN102003935B (zh) * 2010-11-03 2012-10-31 中国科学院光电技术研究所 一种激光跟踪仪测量中环境补偿的方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3656853A (en) * 1966-11-07 1972-04-18 Hewlett Packard Co Interferometric system
US3458259A (en) * 1966-11-07 1969-07-29 Hewlett Packard Co Interferometric system
DE1909728B2 (de) * 1969-02-26 1971-02-18 Interferometrische einrichtung
US3647302A (en) * 1970-05-18 1972-03-07 Bendix Corp Apparatus for and method of obtaining precision dimensional measurements
DE2027983A1 (de) * 1970-06-06 1971-12-16 Ibm Deutschland Verfahren zur Fehlerkompensation

Also Published As

Publication number Publication date
NO793115L (no) 1980-03-31
GB2032098A (en) 1980-04-30
CA1147950A (en) 1983-06-14
BR7904550A (pt) 1980-04-15
IT1119125B (it) 1986-03-03
SE7903801L (sv) 1980-03-29
JPS5546190A (en) 1980-03-31
FR2437609A1 (fr) 1980-04-25
DE2929945A1 (de) 1980-04-17
US4215938A (en) 1980-08-05
AU4927179A (en) 1980-04-03
IL57686A (en) 1982-04-30
GB2032098B (en) 1983-05-25
IL57686A0 (en) 1979-10-31
IT7968625A0 (it) 1979-08-07
JPH0137682B2 (es) 1989-08-09

Similar Documents

Publication Publication Date Title
ES482034A1 (es) Aparato interferometro dotado de haces luminosos de mediciony supervision.
JPS5351785A (en) Comparison type optical measuring apparatus
JPS52126274A (en) Optical system for reflection meter
DK205577A (da) Fejlkompensationsmetode
FR2347914A1 (fr) Interferometre a laser de mesure de l'acuite visuelle
FR2344811A1 (fr) Instrument de mesure lineaire
ZA774361B (en) Distance measuring laser apparatus for delayed time measurements
IL53027A (en) Apparatus for measuring local absorption differences
JPS52146681A (en) Reflection measuring apparatus
FR2341127A1 (fr) Instrument pour la mesure des longueurs
SE7711692L (sv) Kalibreringssystem for gammastralningsreknare
FR2343993A1 (fr) Instrument de mesure lineaire, a ruban enroulable
FR2338491A1 (fr) Electrode de mesure, notamment electrode en verre
CA994547A (en) Optical system for angle measurement by interferometry
JPS5337079A (en) Apparatus for measuring air speed by laser
FR2353846A1 (fr) Appareil pour la mesure de gaz
JPS5395058A (en) Optical arrangement for angle measurement
SU587320A1 (ru) Двухлучевой интерферометр дл измерени перемещений объекта
DK502577A (da) Apparat til maaling af et langs tykkelse
FR2319895A1 (fr) Instruments de mesure en particulier pour mesurer la reflectance optiqu
SU574630A1 (ru) Устройство дл измерени температуры
SU691683A1 (ru) Устройство дл измерени профил поверхности
JPS5313453A (en) Two point contactless optical displacement measuring apparatus
YU39503B (en) Device for adjusting angle positions, particularly for optical measurements
SU630521A1 (ru) Устройство дл измерени перемещений