JPS5543865A - Mask aligner - Google Patents

Mask aligner

Info

Publication number
JPS5543865A
JPS5543865A JP11655378A JP11655378A JPS5543865A JP S5543865 A JPS5543865 A JP S5543865A JP 11655378 A JP11655378 A JP 11655378A JP 11655378 A JP11655378 A JP 11655378A JP S5543865 A JPS5543865 A JP S5543865A
Authority
JP
Japan
Prior art keywords
mask
holder
temperature
thermoregulator
fan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11655378A
Other languages
Japanese (ja)
Inventor
Yoshimitsu Tanaka
Katsumi Taira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11655378A priority Critical patent/JPS5543865A/en
Publication of JPS5543865A publication Critical patent/JPS5543865A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To minimize a temperature fluctuation on mask and wafer and thus to suppress a pitch aberration by framing a mask aligner with an air-cooling device mounted on a mask aligner driving unit, a detector for mask holder temperatures and a thermoregulator to control the air-cooling device.
CONSTITUTION: At aligning where set temperature for a mask holder 2 is specified, a heat generated from a solenoid valve in a driving unit 8 is transferred to a stage group 7 and the holder 2, and a detector 11 detects the temperature. A resistance value of the detector 11 changes, which is sensed on a thermoregulator 12 to rotate a fan 14 and thus the solenoid valve is cooled down. The air in the neighborhood of the holder 2 is sucked in the direction indicated by arrow 15 according to revolutions of the fan 14, and thus a mask 1 is cooled down. Where the holder 2 is cooled down below the set temperature, the fan 14 is stopped running by the thermoregulator 12. The set temperature is given at 31°C which comes nearly intermediate between temperature working in a place to install the mask aligner and temperature rising according to the heat generated by the solenoid valve.
COPYRIGHT: (C)1980,JPO&Japio
JP11655378A 1978-09-25 1978-09-25 Mask aligner Pending JPS5543865A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11655378A JPS5543865A (en) 1978-09-25 1978-09-25 Mask aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11655378A JPS5543865A (en) 1978-09-25 1978-09-25 Mask aligner

Publications (1)

Publication Number Publication Date
JPS5543865A true JPS5543865A (en) 1980-03-27

Family

ID=14689956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11655378A Pending JPS5543865A (en) 1978-09-25 1978-09-25 Mask aligner

Country Status (1)

Country Link
JP (1) JPS5543865A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776851A (en) * 1980-10-31 1982-05-14 Watanabe Shoko:Kk Inspecting device for photoelectric element
JPS57112022A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Mask positioning unit
JPS57164739U (en) * 1981-04-13 1982-10-18

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958770A (en) * 1972-10-04 1974-06-07
JPS5225576A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Exposure method of photo-resist

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958770A (en) * 1972-10-04 1974-06-07
JPS5225576A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Exposure method of photo-resist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776851A (en) * 1980-10-31 1982-05-14 Watanabe Shoko:Kk Inspecting device for photoelectric element
JPS57112022A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Mask positioning unit
JPS57164739U (en) * 1981-04-13 1982-10-18

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