JPS5540175B2 - - Google Patents
Info
- Publication number
- JPS5540175B2 JPS5540175B2 JP3556675A JP3556675A JPS5540175B2 JP S5540175 B2 JPS5540175 B2 JP S5540175B2 JP 3556675 A JP3556675 A JP 3556675A JP 3556675 A JP3556675 A JP 3556675A JP S5540175 B2 JPS5540175 B2 JP S5540175B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3556675A JPS51111072A (en) | 1975-03-26 | 1975-03-26 | Photo etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3556675A JPS51111072A (en) | 1975-03-26 | 1975-03-26 | Photo etching method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51111072A JPS51111072A (en) | 1976-10-01 |
| JPS5540175B2 true JPS5540175B2 (en) | 1980-10-16 |
Family
ID=12445290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3556675A Granted JPS51111072A (en) | 1975-03-26 | 1975-03-26 | Photo etching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51111072A (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5223401A (en) * | 1975-08-15 | 1977-02-22 | Hitachi Ltd | Method of etching photography |
| JPS56111221A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Formation on mask for etching |
| JPS5918634A (en) * | 1982-07-21 | 1984-01-31 | Nec Kyushu Ltd | Manufacturing device of semiconductor device |
| JPS5919323A (en) * | 1982-07-23 | 1984-01-31 | Matsushita Electric Ind Co Ltd | Method for etching |
| JP2597981B2 (en) * | 1985-08-28 | 1997-04-09 | ソニー株式会社 | Method for curing resist film |
| JPH0693423B2 (en) * | 1985-10-21 | 1994-11-16 | 株式会社日立製作所 | Method of forming photoresist pattern |
| JPS62111425A (en) * | 1985-10-28 | 1987-05-22 | Ushio Inc | Method for resist treatment |
| JPS62111426A (en) * | 1985-10-28 | 1987-05-22 | Ushio Inc | Method for treatment of photoresist |
| JPS62113141A (en) * | 1985-11-13 | 1987-05-25 | Fuji Electric Co Ltd | Photolithographic method |
| JPS62183521A (en) * | 1986-02-07 | 1987-08-11 | Nec Kyushu Ltd | Semiconductor device manufacturing equipment |
| JP2589471B2 (en) * | 1986-04-11 | 1997-03-12 | ローム 株式会社 | Method for manufacturing semiconductor device |
| JP2589470B2 (en) * | 1986-04-11 | 1997-03-12 | ローム 株式会社 | Method for manufacturing semiconductor device |
| JPS63115337A (en) * | 1986-11-04 | 1988-05-19 | Matsushita Electronics Corp | Processing of photoresist |
| JPH0740543B2 (en) * | 1987-02-17 | 1995-05-01 | 松下電子工業株式会社 | Method for manufacturing semiconductor device |
| JPH06186755A (en) * | 1993-07-01 | 1994-07-08 | Fujitsu Ltd | Formation of resist pattern |
-
1975
- 1975-03-26 JP JP3556675A patent/JPS51111072A/en active Granted
Non-Patent Citations (1)
| Title |
|---|
| IBM TEHNICAL DISCLOSURE BULLETIN#V15#M1=1972US * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51111072A (en) | 1976-10-01 |