JPS5538936A - Forming method of coating on metal - Google Patents

Forming method of coating on metal

Info

Publication number
JPS5538936A
JPS5538936A JP11037678A JP11037678A JPS5538936A JP S5538936 A JPS5538936 A JP S5538936A JP 11037678 A JP11037678 A JP 11037678A JP 11037678 A JP11037678 A JP 11037678A JP S5538936 A JPS5538936 A JP S5538936A
Authority
JP
Japan
Prior art keywords
metal
coating
workpiece
evaporation
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11037678A
Other languages
Japanese (ja)
Other versions
JPS5756550B2 (en
Inventor
Norihiko Saga
Tsuyoshi Makita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honda Motor Co Ltd
Original Assignee
Honda Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Motor Co Ltd filed Critical Honda Motor Co Ltd
Priority to JP11037678A priority Critical patent/JPS5538936A/en
Publication of JPS5538936A publication Critical patent/JPS5538936A/en
Publication of JPS5756550B2 publication Critical patent/JPS5756550B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a uniform coating of nitride, or carbide of a metal at a relatively low temp. without causing change of material to be worked, by introducing an inert gas and a reactive gas together with metallic halide into a vacuum vessel, and by glow discharge with a evaporating source of a metal as an anode and with the material to be worked as a cathode. CONSTITUTION:A carrier gas such as Ar and a reactive gas such as N2, CH4 are led into an evaporation pot 12 from a conduit 14, and introduced into a treating chamber 2 together with metallic chloride, e.g., TiCl4, then the chamber 2 is filled with the gases of a press. of 1-10<-4> Torr. Thereafter, a voltage of 300-2,000V is applied across a workpiece 7 on the cathode side and a metal evaporation source 6 on the anode side 6, simultaneously an electron beam is irradiated on the coating metal to initiate evaporation. The evaporated metal reacts with the metallic halide to form a lower metallic halide, which is excited and activated, and is accelerated toward the workpiece 7 by the glow discharge, thereby forming a coating on the heated workpiece by the thermal decomposition of the reaction gas.
JP11037678A 1978-09-08 1978-09-08 Forming method of coating on metal Granted JPS5538936A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11037678A JPS5538936A (en) 1978-09-08 1978-09-08 Forming method of coating on metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11037678A JPS5538936A (en) 1978-09-08 1978-09-08 Forming method of coating on metal

Publications (2)

Publication Number Publication Date
JPS5538936A true JPS5538936A (en) 1980-03-18
JPS5756550B2 JPS5756550B2 (en) 1982-11-30

Family

ID=14534227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11037678A Granted JPS5538936A (en) 1978-09-08 1978-09-08 Forming method of coating on metal

Country Status (1)

Country Link
JP (1) JPS5538936A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000022187A1 (en) * 1998-10-15 2000-04-20 Commissariat A L'energie Atomique Method for preparing titanium coatings

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000022187A1 (en) * 1998-10-15 2000-04-20 Commissariat A L'energie Atomique Method for preparing titanium coatings
FR2784694A1 (en) * 1998-10-15 2000-04-21 Commissariat Energie Atomique Preparing complex titanium based multi-layer coatings in single continuous operation, comprises coating a substrate with titanium nitride, titanium carbonitride (with another metal) by plasma-assisted chemical vapour deposition

Also Published As

Publication number Publication date
JPS5756550B2 (en) 1982-11-30

Similar Documents

Publication Publication Date Title
US4805555A (en) Apparatus for forming a thin film
EP0297845A3 (en) Plasma assisted apparatus and method of diamond synthesis
FR2464309B1 (en) PROCESS FOR PRODUCING GOLD-COLORED COATINGS
JPS57158370A (en) Formation of metallic thin film
DE59203997D1 (en) Method and device for material evaporation in a vacuum container.
JPS5538936A (en) Forming method of coating on metal
US3616383A (en) Method of ionitriding objects made of high-alloyed particularly stainless iron and steel
JPS5457477A (en) Throw away tip of coated tool steel
JPS5489983A (en) Device and method for vacuum deposition compound
RU2006538C1 (en) Diamond growing method
JPS6465092A (en) Formation of thin diamond film
FR2425479A1 (en) Vacuum coating appts. for prodn. of metal carbide or nitride films - where a reaction gas is passed through a hollow cathode gun for heating vapour source
JPS5719034A (en) Vapor growth apparatus
JPS56156760A (en) Method and apparatus for forming coat
JPS5662959A (en) Blackening method for surface of metal
RU2068029C1 (en) Method of plasma-chemical application of coating
JPS57196710A (en) Plasma vapor phase method
JPS54155156A (en) Vacuum brazing apparatus
JPH0372069A (en) Method for continuously vapor-depositing compound on metal strip
JPH0233786B2 (en) KAGOBUTSUMAKUNOKEISEIHOHO
JPS57104661A (en) Method for coating of metallic carbide film
JPS6446936A (en) Growth method of thin film
SU720049A1 (en) Gaseous medium for ionic nitriding of steel parts
JPS591676A (en) Ion plating device
SU901352A1 (en) Coating device